Installation Report

08-27-2026

RAITH Voyager E-Beam DVIA-ML1000 Installation Report

DVIA-M Series

Installation Report

Dingxin Optoelectronics Technology

RAITH

E-Beam

Voyager

DVIA-ML1000

260422R1-1

Suzhou

Overview

Following the installation of DVIA-ML1000 at Suzhou, tuning and vibration measurement were performed.

Vibration measurement was conducted with the equipment in the Idle state.

Data is represented in Autospectrum format and reference material on the vibration level is provided.

Vibration Isolation System Information

Model: DVIA-ML1000

Serial Number: 260422R1-1

Engineer

Younguk KIM · DAEIL SYSTEMS

Tuning Date

2026.08.27

End User

Dingxin Optoelectronics Technology (苏州鼎芯光电)

Number of Tuning Trial

1st

Site

Suzhou

Equipment

Manufacturer: RAITH

Equipment: E-Beam

Model: Voyager

Vibration Specification

Horizontal

Frequency [Hz]	Allowable [µm/s RMS]
1.6	0.8
16	0.8
16	1
100	1

Vertical

Frequency [Hz]	Allowable [µm/s RMS]
1.6	0.8
16	0.8
16	1
100	1

Equipment Condition

Idle

Tuning Request

N/A

Conclusion

Vibration measurements were performed at two positions — the installation floor and the top surface of the DVIA-M-RVE active vibration isolation system — and evaluated against the criteria defined in Section 9.

At the floor level, all three axes (Vertical, Left-to-Right, and Front-to-Back) failed to satisfy the specified criteria, indicating that the ambient floor condition alone is not adequate to support the operating requirements of the installed equipment.

Following installation of the DVIA-M-RVE, the Vertical and Front-to-Back axes measured on the isolation system satisfy the specified criteria. However, the Left-to-Right (X) axis remains out of compliance due to a resonance occurring at approximately 9 Hz, attributed to mechanical interference from equipment installed above the isolation system. Re-tuning is scheduled to be performed once the source of this mechanical interference has been identified and minimized, in order to achieve full compliance across all axes.

Measurement Summary

Measurement Point	Vibration Specifications	Axis	Result
Measurement Point	Vibration Specifications	Axis	Floor	DVIA-M-RVE
1. Floor 2. DVIA-ML1000	See Section 9	Vertical	✗ FAIL	✓ PASS
		Left to Right	✗ FAIL	✗ FAIL
		Front to Back	✗ FAIL	✓ PASS

Measurement Data Obtained via UI Program

Vertical

Vertical — Autospectrum

Image 1 — RAITH Voyager E-Beam DVIA-ML1000 Installation Report

Left to Right

Left to Right — Autospectrum

Image 2 — RAITH Voyager E-Beam DVIA-ML1000 Installation Report

Front to Back

Front to Back — Autospectrum

Image 3 — RAITH Voyager E-Beam DVIA-ML1000 Installation Report

Installation Photo

Equipment

Image 4 — RAITH Voyager E-Beam DVIA-ML1000 Installation Report

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion Curve	Description	Amplitude µm/s (µin/s)	Detail Size µm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.	100 (4,000)	25
VC-A	Adequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment (including steppers) to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.	12.5 (500)	1–3
VC-D	Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.	6.25 (250)	0.1–0.3
VC-E	A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.	3.12 (125)	<0.1
VC-F	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	1.56 (62.5)	N/A
VC-G	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	0.78 (31.3)	N/A

¹ As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

² The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc. It is to imaging associated with probe technologies, AFMs, and nanotechnology.

The information given in this table is for guidance only. In most instances, it is recommended that the advice of someone knowledgeable about applications and vibration requirements of the equipment and processes be sought.