Installation Report

08-25-2026

Hubei University of Technology RAITH Electron Beam Lithography Pioneer Two DVIA-ML1000 Installation Report

DVIA-M Series

Installation Report

YIMOTECH

Hubei University of Technology

RAITH

Electron Beam Lithography

Pioneer Two

DVIA-ML1000

260209R6

Wuhan

Overview

Following the installation of DVIA-ML1000 at Wuhan, tuning and vibration measurement were performed.

Vibration measurement was conducted with the equipment in the Turned off state.

Data is represented in Autospectrum and reference material on the vibration level is provided.

Vibration Isolation System Information

Model: DVIA-ML1000

Serial Number: 260209R6

Engineer

Taehun Kim · DAEIL SYSTEMS

Tuning Date

2026.08.25

End User

Hubei University of Technology

Number of Tuning Trial

1st

Site

Wuhan

Equipment

Manufacturer: RAITH

Equipment: Electron Beam Lithography

Model: Pioneer Two

Vibration Specification

Horizontal

Frequency [Hz]	Allowable [µm/s RMS]
1	0.8
16	0.8
16	1
100	1

Vertical

Frequency [Hz]	Allowable [µm/s RMS]
1	0.8
16	0.8
16	1
100	1

Equipment Condition

Turned off

Tuning Request

Image 1 — Hubei University of Technology RAITH Electron Beam Lithography Pioneer Two DVIA-ML1000 Installation Report

Conclusion

The vibration measurements confirm that the DVIA-ML1000 active vibration isolation system provides effective attenuation across the frequency bands where meaningful floor vibration is present.

In the horizontal (X and Y) axes, the ambient floor vibration in the 1–2 Hz range is exceptionally low, approaching the noise floor of the measurement system. As a result, the transmissibility data in this narrow band indicates a slight amplification relative to the floor input. It should be noted, however, that the absolute vibration amplitude in this region remains on the order of tens of nanometers, which is well below the threshold at which any measurable effect on the imaging or lithography performance of the RAITH PIONEER SEM would be expected. This behavior is characteristic of active isolation systems operating in an environment where the input excitation is near the measurement resolution limit, and it does not represent a deficiency in isolation performance.

Across all frequency bands in which identifiable floor vibration is present, the system demonstrates clear and consistent attenuation, confirming that the installation meets the intended isolation objectives. The site is therefore considered suitable for the operation of the installed equipment.

Measurement Summary

Measurement Point	Vibration Specifications	Axis	Result
Measurement Point	Vibration Specifications	Axis	Floor	DVIA-ML1000
1. Floor 2. DVIA-ML1000	See Section 9	Vertical	✗ FAIL	✓ PASS
		Left to Right	✓ PASS	✓ PASS
		Front to Back	✓ PASS	✓ PASS

Measurement Data Obtained via UI Program

Vertical

Vertical — Autospectrum

Image 2 — Hubei University of Technology RAITH Electron Beam Lithography Pioneer Two DVIA-ML1000 Installation Report

Left to Right

Left to Right — Autospectrum

Image 3 — Hubei University of Technology RAITH Electron Beam Lithography Pioneer Two DVIA-ML1000 Installation Report

Front to Back

Front to Back — Autospectrum

Image 4 — Hubei University of Technology RAITH Electron Beam Lithography Pioneer Two DVIA-ML1000 Installation Report

Installation Photo

Equipment

Image 5 — Hubei University of Technology RAITH Electron Beam Lithography Pioneer Two DVIA-ML1000 Installation Report

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion Curve	Description	Amplitude (μm/s) (μin/s)	Detail Size (μm)
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.	100 (4,000)	25
VC-A	Adequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment (including steppers) to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.	12.5 (500)	1-3
VC-D	Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.	6.25 (250)	0.1-0.3
VC-E	A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.	3.12 (125)	<0.1
VC-F	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	1.56 (62.5)	N/A
VC-G	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	0.78 (31.3)	N/A

Notes:

1. As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

2. The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc. It is to imaging associated with probe technologies, AFMs, and nanotechnology.

The information given in this table is for guidance only. In most instances, it is recommended that the advice of someone knowledgeable about applications and vibration requirements of the equipment and processes be sought.