Installation Report

08-28-2026

RAITH Voyager DVIA-ML1000 Installation Report

DVIA-M Series

Installation Report

YIMOTECH

Suzhou Dingxin Photoelectric

RAITH

Electron Beam Lithography system

Voyager

DVIA-ML1000

260422R1-2

Suzhou

Overview

Following the installation of DVIA-ML1000 at Suzhou, tuning and vibration measurement were performed.

Vibration measurement was conducted with the equipment in the Idle state.

Data is represented in Autospectrum format and reference material on the vibration level is provided.

Vibration Isolation System Information

Model: DVIA-ML1000

Serial Number: 260422R1-2

Engineer

Taehun Kim · DAEIL SYSTEMS

Tuning Date

2026.08.28

End User

Suzhou Dingxin Photoelectric

Number of Tuning Trial

2nd

Site

Suzhou

Equipment

Manufacturer: RAITH

Equipment: Electron Beam Lithography system

Model: Voyager

Vibration Specification

Horizontal

Frequency [Hz]	Allowable [µm/s RMS]
1	0.8
16	0.8
16	1
100	1

Vertical

Frequency [Hz]	Allowable [µm/s RMS]
1	0.8
16	0.8
16	1
100	1

Equipment Condition

Idle

Tuning Request

Image 1 — RAITH Voyager DVIA-ML1000 Installation Report

Conclusion

Vibration measurements were performed at two positions — the installation floor and the top surface of the DVIA-ML1000 active vibration isolation system — and evaluated against the criteria defined in Section 9.

At the floor level, all three axes (vertical, left-to-right, and front-to-back) exceeded the specified criteria, indicating that the ambient vibration environment at the installation site is not adequate to support the operating requirements of the equipment.

A second tuning iteration was carried out to optimize the control parameters for the installed configuration. Following this adjustment, all three axes measured on the isolation system satisfy the specified criteria, confirming that the DVIA-ML1000 provides sufficient attenuation to bring the equipment environment into compliance.

It should be noted that a localized response was observed in the 9–10 Hz range on the isolated surface. Based on its frequency characteristics and axis behavior, this response is presumed to originate from mechanical interference between the equipment and adjacent structures or connected utilities rather than from the isolation system itself.

Although the measured levels remain within the specified criteria and no impact on equipment operation is expected, it is recommended that the routing of connected lines and any physical contact points around the isolated platform be reviewed to eliminate the potential transmission path.

Measurement Summary

Measurement Point	Vibration Specifications	Axis	Result
Measurement Point	Vibration Specifications	Axis	Floor	DVIA-ML1000
1. Floor 2. DVIA-ML1000	See Section 9	Vertical	✗ FAIL	✓ PASS
		Left to Right	✗ FAIL	✓ PASS
		Front to Back	✗ FAIL	✓ PASS

Measurement Data Obtained via UI Program

Vertical

Vertical — Autospectrum

Image 2 — RAITH Voyager DVIA-ML1000 Installation Report

Left to Right

Left to Right — Autospectrum

Image 3 — RAITH Voyager DVIA-ML1000 Installation Report

Front to Back

Front to Back — Autospectrum

Image 4 — RAITH Voyager DVIA-ML1000 Installation Report

Installation Photo

Equipment

Image 5 — RAITH Voyager DVIA-ML1000 Installation Report

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion Curve	Description	Amplitude¹μm/s (μin/s)	Detail Size²μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.	100 (4,000)	25
VC-A	Adequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment (including steppers) to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.	12.5 (500)	1-3
VC-D	Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.	6.25 (250)	0.1-0.3
VC-E	A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.	3.12 (125)	<0.1
VC-F	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	1.56 (62.5)	N/A
VC-G	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	0.78 (31.3)	N/A

¹ As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

² The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc. It is not relevant to imaging associated with probe technologies, AFMs, and nanotechnology.

The information given in this table is for guidance only. In most instances, it is recommended that the advice of someone knowledgeable about applications and vibration requirements of the equipment and processes be sought.