Installation Report

08-24-2026

ZEISS Gemini SEM 560 FE-SEM DVIA-ML1000 Installation Report

DVIA-M Series

Installation Report

Korea Water Resources Corporation

ZEISS

FE-SEM

Gemini SEM 560

DVIA-ML1000

260316R3

Overview

Following the installation of DVIA-ML1000 at the 1st floor cleanroom of the Water Quality Center, Building 5, Korea Water Resources Corporation, tuning and vibration measurement were performed.

Inspection and vibration measurement were conducted with the equipment in the IDLE state.

Data is represented in VC Curve format and reference material on the vibration level is provided.

Vibration Isolation System Information

Model: DVIA-ML1000

Serial Number: 260316R3

Engineer

Taehun Kim, Gyumin Park · DAEIL SYSTEMS

Tuning Date

2026.08.24

Site

1st floor cleanroom, Water Quality Center, Building 5, Korea Water Resources Corporation

End User

Korea Water Resources Corporation

Equipment

Manufacturer: ZEISS

Equipment: FE-SEM

Model: Gemini SEM 560

Vibration Specification

Horizontal

Allowable horizontal vibration values (Resolution 0.5 Hz):

Frequency Range [Hz]	Allowable [μm/s rms]
Up to 10	less than 5
10 ~ 60	less than 10
Above 60	less than 14

Vertical

Allowable vertical vibration values (Resolution 0.5 Hz):

Frequency Range [Hz]	Allowable [μm/s rms]
Up to 10	less than 4
10 ~ 60	less than 14
Above 60	less than 20

Equipment Condition

IDLE

Measurement Equipment

Hardware: QUATTRO, Serial Number: 22436

Software: SignalCalc ACE

Accelerometer: PCB 393B05

Measurement Setup

F Span: 200 Hz

Lines: 2400

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

Conclusion

The 2nd tuning was performed on 2026.08.24 at the 1st floor cleanroom of the Water Quality Center, Building 5, Korea Water Resources Corporation.

Active tuning was applied to the maximum extent to ensure stability, and as a result the vibration specification of the ZEISS FE-SEM was met.

After the final tuning was completed, ZEISS operated the FE-SEM and performed a resolution verification test, confirming that the normal performance was achieved without any vibration-related issues.

Measurement Summary

Measurement Point	Vibration Specifications	Axis	Result
Measurement Point	Vibration Specifications	Axis	Floor	DVIA-ML1000
1. Floor 2. DVIA-ML1000	See Section 8	Vertical (Z-axis)	✓ PASS	✓ PASS
		Left to Right (X-axis)	✓ PASS	✓ PASS
		Front to Back (Y-axis)	✓ PASS	✓ PASS

Measurement Data

Vertical (Z-axis)

Z-axis — Autospectrum

Image 1 — ZEISS Gemini SEM 560 FE-SEM DVIA-ML1000 Installation Report

Left to Right (X-axis)

X-axis — Autospectrum

Image 2 — ZEISS Gemini SEM 560 FE-SEM DVIA-ML1000 Installation Report

Front to Back (Y-axis)

Y-axis — Autospectrum

Image 3 — ZEISS Gemini SEM 560 FE-SEM DVIA-ML1000 Installation Report

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion Curve	Description	Amplitude µm/s (µin/s)	Detail Size µm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.	100 (4,000)	25
VC-A	Adequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment (including steppers) to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.	12.5 (500)	1-3
VC-D	Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.	6.25 (250)	0.1-0.3
VC-E	A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.	3.12 (125)	<0.1
VC-F	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	1.56 (62.5)	N/A
VC-G	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	0.78 (31.3)	N/A

¹ As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

² The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc. It is not relevant to imaging associated with probe technologies, AFMs, and nanotechnology.

The information given in this table is for guidance only. In most instances, it is recommended that the advice of someone knowledgeable about applications and vibration requirements of the equipment and processes be sought.