Installation Report

DVIA-M Series

07-01-2026

YIMOTECH Hitachi HT7800 TEM DVIA-ML1000 Installation Report

DVIA-M Series

Installation Report

YIMOTECH

Ruijin Hospital

Hitachi High-Tech

HT7800

TEM

DVIA-ML1000

250828R8

Shanghai

Overview

Following the installation of DVIA-ML1000 at Shanghai, China, tuning and vibration measurement were performed.

Vibration measurement was conducted with the equipment in the turned on/IDLE state.

Data is represented in VC Curve format and reference material on the vibration level is provided.

Vibration Isolation System Information

Model: DVIA-ML1000

Serial Number: 250828R8

Engineer

Juhyeok KIM · DAEIL SYSTEMS

Tuning Date

2026.04.28

Report Written Date

2026.07.01

End User

Ruijin Hospital

Number of Tuning Trial

1st

Location

Shanghai, China

Equipment

Manufacturer: Hitachi High-Tech

Equipment: TEM

Model: HT7800

Vibration Specification

Horizontal

Frequency [Hz]	Limit [µm pk-pk]
1	2
3	0.8
20	1.5
100	2

Vertical

Frequency [Hz]	Limit [µm pk-pk]
1	3
3	3
20	1.5
100	1

Equipment Condition

Turned on/IDLE

Tuning Request

Conclusion

The vibration isolation performance of the DVIA-ML1000 was evaluated for installation beneath the Hitachi High-Tech Transmission Electron Microscope (TEM), Model HT7800. Based on the measurement results, the DVIA-ML1000 satisfies the vibration specification required for stable operation of the HT7800, confirming its suitability for this application.

Measurement Summary

Measurement Point	Vibration Specifications	Axis	Floor	DVIA-ML1000
1. Floor 2. DVIA-ML1000	See Section 9	Vertical	✓ PASS	✓ PASS
		Left to Right	✓ PASS	✓ PASS
		Front to Back	✓ PASS	✓ PASS

Measurement Data Obtained via UI Program

Vertical Autospectrum

Left to Right Autospectrum

Front to Back Autospectrum

Installation Photo

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion Curve	Description	Amplitude (μm/s) (μin/s)	Detail Size (μm)
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.	100 (4,000)	25
VC-A	Adequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment (including steppers) to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.	12.5 (500)	1-3
VC-D	Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.	6.25 (250)	0.1-0.3
VC-E	A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.	3.12 (125)	< 0.1
VC-F	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	1.56 (62.5)	N/A
VC-G	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	0.78 (31.3)	N/A

Notes:

1. As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

2. The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc.