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Installation Report
DVIA-M Series
02-05-2026

Hitachi SEM Hitachi SU3800SEPlus DVIA-ML1000 (250304R4) Installation Report

DVIA-M Series
Installation Report
Hitachi
SEM
SU3800SEPlus
DVIA-ML1000
250304R4

Contents

Overview

The DVIA-ML1000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-ML1000

Serial Number: 250304R4

Engineer

Chaewon Lee

Tuning Date

26.02.03

Report written date

26.02.05

End User

N/A

Number of Tuning Trial

1st

Location

N/A

Equipment

Manufacturer: Hitachi

Equipment: SEM

Model: Hitachi SU3800SEPlus

Vibration Specification

Equipment Condition

The equipment is turned on/IDLE

Measurement Summary

Measurement PointStatusAxisMeasurement Data
FloorDVIA-ML1000
1.Floor 2.DVIA-ML1000PXB-BE-200HV is turned on/IDLEVerticalVC-C @ 3.15 HzVC-G @ 3.15 Hz
Left to RightVC-B @ 2.5 HzVC-G @ 2.5 Hz
Front to BackVC-B @ 3.15 HzVC-G @ 3.15 Hz

Data and Image

Figure

Vertical Autospectrum

Vertical Autospectrum

Vertical Autospectrum

Vertical Transmissibility

Left to Right Autospectrum

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Transmissibility

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date02-05-2026
Tags
DVIA-M Series
Installation Report
Hitachi
SEM
SU3800SEPlus
DVIA-ML1000
250304R4

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