Installation Report

DVIA-M Series

03-10-2026

Hitachi SU3800 SEM DVIA-ML1000 (241016R4) Installation Report

DVIA-M Series

Installation Report

Hitachi

SU3800

SEM

DVIA-ML1000

241016R4

Overview

The DVIA-ML1000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-ML1000

Serial Number: 241016R4

Engineer

Chaewon Lee DAEIL SYSTEMS

Tuning Date

March 4, 2026

Report written date

March 10, 2026

End User

N/A

Number of Tuning Trial

1st

Location

N/A

Equipment

Manufacturer: Hitachi

Equipment: SEM

Model: Hitachi SU3800

Vibration Specification

Equipment Condition

The equipment is turned on/IDLE

Tuning Request

N/A

Measurement Summary

Measurement Point	Status	Axis	VibrationSpecification	Floor	DVIA-ML1000	Result	Result
1.Floor 2.DVIA-ML1000	Equipment is Turned on/IDLE	Vertical	Refer to item 9	VC-D @ 3.15 Hz	VC-G @ 3.15 Hz	✗ FAIL	✓ PASS
		Left to Right		VC-D @ 2.5 Hz	VC-G @ 2.5 Hz	✗ FAIL	✓ PASS
		Front to Back		VC-D @ 3.15 Hz	VC-G @ 3.15 Hz	✗ FAIL	✓ PASS

Measurement Data Obtained via UI Program

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Equipment picture

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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