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Installation Report
DVIA-M Series
12-04-2024

Xi'an Jiaotong University ZEISS Sigma300 SEM DVIA-M1000 (231009R3) Installation Report

DVIA-M Series
Installation Report
Xi'an Jiaotong University
ZEISS
Sigma300
SEM
DVIA-M1000
231009R3

Contents

Overview

Xi'an Jiaotong University

(M1000_ 231009R3 Set-up)

Target equipmentZEISS Sigma300
Place of installationXi'an
RemarkGood Performance
END USERXi'an Jiaotong University

Operator: Chaewon Lee

Date of setup: 24.11.29

Date of reporting: 24.12.04

Date of business trip : 17.12.27~17.12.29

Overview

The DVIA-M1000 active vibration isolation platform is appropriately installed and functioning as intended.

Measurement date: 2024.11.29(Friday)

Operator: Chaewon Lee from DAEIL SYSTEMS

Place of measurement: Xi'an

End User: Xi'an Jiaotong University

Equipment Model:

Manufacturer: ZEISS

Equipment: SEM

Model: Sigma300

5.

Equipment

M1000 internal program performance measurement result

Vertical

Vertical Transmissibility and Coherence

Left to Right

Left to Right Transmissibility and Coherence

Front to Back

Front to Back Transmissibility and Coherence

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

2. Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date12-04-2024
Tags
DVIA-M Series
Installation Report
Xi'an Jiaotong University
ZEISS
Sigma300
SEM
DVIA-M1000
231009R3

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