Installation Report

DVIA-M Series

08-11-2022

Shanghai Veterinary Research Institute DVIA-M1000 Installation Report (220714R2)

DVIA-M Series

Installation Report

DVIA-M1000

Shanghai Veterinary Research Institute

CAAS

Overview

The DVIA-M1000 active vibration isolation platform is appropriately installed and functioning as intended.

Installation and reporting information

Target equipment: TBD

Place of installation: Shanghai

Remark: Good Performance

End user: Shanghai Veterinary Research Institute, CAAS（中国农业科学院上海兽医研究所）

Operator: Yu, Ho Sang

Date of setup: 22.08.09

Date of reporting: 22.08.11

Date of business trip: 17.12.27~17.12.29

Measurement date: 2022.08.09 (Tuesday)

Measurement operator: DAEIL SYSTEMS, Hosang Yu

Place of measurement: Shanghai

Equipment model: TBD

Measurement summary

Test condition: VC-Class

	Z	X	Y
Floor	C	B	C
Above Active	C	B	D

Good omnidirectional performance.

Data and Image

(M1000_ 220714R2 Set up)

Z axis — MB1000 program

X axis — MB1000 program

Y axis — MB1000 program

Z axis — octave band

X axis — octave band

Y axis — octave band

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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