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Installation Report
DVIA-M Series
02-22-2023

Tier-1 Semiconductor Hitachi S-4800 DVIA-MB1000 (210609R4) Installation Report — 2023.02.22

DVIA-M Series
Installation Report
Tier-1 Semiconductor
Suwon
Hitachi
S-4800
FESEM
DVIA-MB1000
210609R4

Contents

Prepared for

Tier-1 Semiconductor

Prepared by

Engineer: Youngha Lee, Sangjae Lee

Tuning date: 23.02.08

Report written date: 23.02.22

DAEIL SYSTEMS (인)

Date of business trip

17.12.27~17.12.29

Overview

The DVIA-MB1000 active vibration isolation platform is appropriately installed and functioning as intended.

Board replacement works normally.

System Information

Model: DVIA-MB1000

Serial Number: 210609R4

Engineer

Sangjae Lee, Youngha Lee from DAEIL SYSTEMS

Tuning Date

Feb 08, 2023

Location

Tier-1 Semiconductor research site, Suwon

Equipment

FESEM Hitachi s-4800

Summary of Vibration Results

Measurement PointFloorActive
Z-axis (Vertical) 1-10 HzAD
Z-axis (Vertical) 10-80 HzAE
X-axis (Left to Right) 1-10 HzCF
X-axis (Left to Right) 10-80 HzBG
Y-axis (Front to Back) 1-10 HzBE
Y-axis (Front to Back) 10-80 HzBG

Data and Image

Z-axis (Vertical) Floor VC curves

Z-axis (Vertical) Top VC curves

X-axis (Left to Right) Floor VC curves

X-axis (Left to Right) Top VC curves

Y-axis (Front to Back) Floor VC curves

Y-axis (Front to Back) Top VC curves

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date02-22-2023
Tags
DVIA-M Series
Installation Report
Tier-1 Semiconductor
Suwon
Hitachi
S-4800
FESEM
DVIA-MB1000
210609R4

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