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Installation Report
09-23-2026

Hitachi High-Tech TEM HT7830 DVIA-ULFB1000 Installation Report

DVIA-ULF Series
Installation Report
Hitachi High-Tech
TEM
TEM HT7830
DVIA-ULFB1000
260611R4
Suwon

Overview

After the installation of the DVIA-ULFB1000 in the 1st-floor laboratory of the Hitachi NCK Center, tuning and vibration measurement were performed.

Inspection and vibration measurement were carried out in the as-is condition.

The measurement data are presented in VC Curve format, along with reference material on the vibration levels.

Vibration Isolation System Information

Model: DVIA-ULFB1000

Serial Number: 260611R4

Engineer

Gyumin Park, Changhyun Moon · DAEIL SYSTEMS

Tuning Date

2026.09.23

Installation Site

1st-floor laboratory, Hitachi Suwon NCK Center

End User

Hitachi High-Tech

Customer Equipment

Manufacturer: Hitachi High-Tech

Equipment: TEM

Model: HT7830

Vibration Specification

Horizontal

Frequency [Hz]Specification [µm pk-pk]
12
10.8
30.8
31.5
201.5
202
1002

Vertical

Frequency [Hz]Specification [µm pk-pk]
13
33
31.5
201.5
201
1001

Equipment Condition

IDLE

Vibration Measurement Equipment

10.1) Measurement Equipment

Hardware: B&K Front End Type 3040-A-040

Software: B&K Pulse Labshop22 Version

10.2) Accelerometer

PCB 393B05

Vibration Measurement Setup

F Span: 200 Hz

Lines: 2400

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

Conclusion

To secure a stable operating environment for the Hitachi High-Tech TEM (HT7830) installed in the 1st-floor laboratory of the Hitachi NCK Center, the installation and tuning of the DVIA-ULFB1000 (S/N 260611R4) vibration isolation platform were carried out. The measurement results confirmed that the inherent floor vibration at the installation location was already at the VC-E level on the vertical (Z-axis) and the VC-G level on the horizontal (X/Y-axis), a very excellent low-vibration environment. Accordingly, this tuning was focused on securing long-term operational stability rather than pursuing aggressive vibration reduction performance, and as a result it was confirmed that the equipment's required vibration specification (Section 8) is stably satisfied on all axes (Z, X, Y). This confirms that the current installation location provides a very suitable vibration environment for the operation of the TEM (HT7830), and stable equipment operation is expected to continue in the future.

Measurement Data Summary

Measurement PointVibration SpecificationMeasurement AxisMeasurement Result
FloorDVIA-ULFB1000
1. Floor
2. DVIA-ULFB1000
See Section 8Vertical (Z-axis)✓ PASS✓ PASS
Left to Right (X-axis)✓ PASS✓ PASS
Front to Back (Y-axis)✓ PASS✓ PASS

Measurement Data

Z-axis — Autospectrum

X-axis — Autospectrum

Y-axis — Autospectrum

Installation Photo

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion CurveDescriptionAmplitude
(μm/s) (μin/s)
Detail Size
(μm)
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.100 (4,000)25
VC-AAdequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment (including steppers) to 3μm line widths.25 (1,000)3
VC-CAppropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.12.5 (500)1-3
VC-DSuitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.6.25 (250)0.1-0.3
VC-EA challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.3.12 (125)< 0.1
VC-FAppropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.1.56 (62.5)N/A
VC-GAppropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.0.78 (31.3)N/A

Notes:

1. As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

2. The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc. It is to imaging associated with probe technologies, AFMs, and nanotechnology.

The information in this table is provided for reference. In most cases it is advisable to seek the advice of a specialist familiar with the application and the vibration requirements of the equipment and process.

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Case Study Information

Category
Installation Report
Date09-23-2026
Tags
DVIA-ULF Series
Installation Report
Hitachi High-Tech
TEM
TEM HT7830
DVIA-ULFB1000
260611R4
Suwon