Installation Report

DVIA-ML Series

07-15-2026

Biel Crystal Manufactory Limited Raith EBPG5200 Plus E-Beam Lithography DVIA-ML3000S (260406R2-1) Installation Report

DVIA-ML Series

Installation Report

YIMO TECH

Biel Crystal Manufactory Limited

Raith

EBPG5200 Plus

E-Beam Lithography

DVIA-ML3000S

260406R2-1

Huiyang

China

Overview

Following the installation of DVIA-ML3000S at Huiyang, tuning and vibration measurement were performed.

Vibration measurement was conducted with the equipment in the IDLE state.

Data is represented in VC Curve format and reference material on the vibration level is provided.

Vibration Isolation System Information

Model: DVIA-ML3000S

Serial Number: 260406R2-1

Engineer

Gyumin Park · DAEIL SYSTEMS

Tuning Date

2026.07.15

Report Written Date

2026.07.20

Customer

YIMO TECH

End User

Biel Crystal Manufactory Limited

Number of Tuning Trial

1st

Site

Huiyang

Equipment

Manufacturer: Raith

Equipment: E-Beam Lithography

Model: EBPG5200 Plus

Vibration Specification

Horizontal

Frequency [Hz]	Allowable [µm/s RMS]
1	8
5	8
6.3	6.94
8	6
10	7.35
12.5	9.01
16	11.28
20	13.82
25	16.94
31.5	19.32
40	16.32
50	13.94
63	11.84
80	10
100	12.5

Vertical

Frequency [Hz]	Allowable [µm/s RMS]
1	8
5	8
6.3	6.94
8	6
10	7.35
12.5	9.01
16	11.28
20	13.82
25	16.94
31.5	19.32
40	16.32
50	13.94
63	11.84
80	10
100	12.5

Equipment Condition

IDLE

Tuning Request

Measurement Summary

Case 1

Measurement Point	Vibration Specifications	Axis	Result
Measurement Point	Vibration Specifications	Axis	Floor	DVIA-ML3000S
1.Floor 2.DVIA-ML3000S	See Section 9	Vertical	✓ PASS	✓ PASS
		Left to Right	✓ PASS	✓ PASS
		Front to Back	✓ PASS	✓ PASS

Measurement Data Obtained via UI Program

Vertical Autospectrum

Left to Right Autospectrum

Front to Back Autospectrum

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.	100 (4,000)	25
VC-A	Adequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment (including steppers) to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.	12.5 (500)	1-3
VC-D	Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.	6.25 (250)	0.1-0.3
VC-E	A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.	3.12 (125)	<0.1
VC-F	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	1.56 (62.5)	N/A
VC-G	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	0.78 (31.3)	N/A

Notes:

- As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

- The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc. It is to imaging associated with probe technologies, AFMs, and nanotechnology.

The information given in this table is for guidance only. In most instances, it is recommended that the advice of someone knowledgeable about applications and vibration requirements of the equipment and processes be sought.