Tier-1 Semiconductor ZEISS X-ray Microscope DVIA-ULF1500 Installation Report

This report describes the tuning and vibration measurement results for the DVIA-ULF1500 that was relocated and installed in the mass production quality team cleanroom on the 6th floor of the C3 line.

The measurement was performed with the active vibration isolation of the platform running (Active On), and the vibration reduction effect was comparatively analyzed on the base (Base) and top (Top) of the platform. The upper equipment, the ZEISS Xradia 730 Versa, was also inspected and measured in the powered-on (Turn On) state. The measurement point was selected as the central point between the two ULF modules, and the three axes — vertical (Z-axis), left-to-right (X-axis), and front-to-back (Y-axis) — were measured at that point.

The measurement data are presented in VC Curve format, plotted together with the installation vibration requirement (Installation Requirement) provided by the equipment manufacturer as the SPEC baseline so that compliance can be compared directly. In addition, the classification criteria of Section 14, IEST-RP-CC012.2, are provided as reference material for the current vibration level.

Model: DVIA-ULF1500

Serial Number: 260402R2

Taehun Kim · DAEIL SYSTEMS

2026.09.11

Mass production quality team line cleanroom, 6th floor of the C3 line

Manufacturer: ZEISS

Equipment: X-ray Microscope

Model: Xradia 730 Versa

VC-C

Turn on

9.1) Measurement Equipment

Hardware: Bruel & Kjaer Type 3050-A-040

Software: Pulse 22

9.2) Accelerometer

PCB Accelerometer 393B05, 2 EA (Top, Base)

F Span: 200 Hz

Lines: 2400

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

This measurement was carried out, after the completion of tuning of the DVIA-ULF1500 relocated and installed in the mass production quality team cleanroom on the 6th floor of the C3 line, to quantitatively confirm the vibration reduction effect in the active vibration isolation operating state.

As a result of the measurement, at the central point between the two ULF modules the floor vibration was effectively reduced, satisfying the specification on all axes, and was confirmed to be within the VC-C grade. The effect of active vibration isolation was confirmed in the low-frequency region where passive reduction is limited.

Since this system is structured such that the two ULF modules interact through the upper equipment, the vibration performance judgment was made on the basis of the central point between the two modules where the equipment is actually supported, and at that reference point the VC-C grade is satisfied on all axes. No vibration-induced limiting factors were observed in the operation of the ZEISS equipment under the current installation state.

[Follow-up Action Plan]

If vibration-induced performance anomalies are confirmed during future equipment operation, spring adjustment and re-tuning will be performed through an on-site visit.

This judgment is based on the environmental conditions at the time of measurement. Since vibration levels may change when the equipment operating conditions or the installation environment (addition of adjacent equipment, air conditioning, utility changes, etc.) vary, re-measurement is recommended when the environment changes.

Z-axis — VC Curves