Installation Report

06-12-2026

Korea Water Resources Corporation (KOWOL) ZEISS GeminiSEM 560 FE-SEM DVIA-ML1000 Installation Report

DVIA-M Series

Installation Report

Korea Water Resources Corporation (KOWOL)

Korea Water Resources Corporation

ZEISS

FE-SEM

GeminiSEM 560

DVIA-ML1000

260316R3

Overview

After the initial setup and tuning of the DVIA-ML1000 installed on the DVIF independent foundation, the floor vibration under the grating and the vibration on the top of the isolation system were measured for performance evaluation.

The measured data is presented as Autospectrum and VC Curves, along with reference material on the vibration levels.

Isolation System

Model: DVIA-ML1000

Serial Number: 260316R3

Engineer

Juhyeok Kim · DAEIL SYSTEMS

Tuning Date

2026.06.12

Site

Korea Water Resources Corporation, Daejeon

End User

Customer: Korea Water Resources Corporation (KOWOL)

Customer Equipment

Manufacturer: ZEISS

Equipment: FE-SEM

Model: GeminiSEM 560

Vibration Specification

Horizontal

Frequency [Hz]	Limit [µm/s RMS] (Resolution 0.5 Hz)
Up to 10 Hz	less than 5 μm/s rms
10 - 60 Hz	less than 10 μm/s rms
Above 60 Hz	less than 14 μm/s rms

Vertical

Frequency [Hz]	Limit [µm/s RMS] (Resolution 0.5 Hz)
Up to 10 Hz	less than 4 μm/s rms
10 - 60 Hz	less than 14 μm/s rms
Above 60 Hz	less than 20 μm/s rms

Equipment Condition

IDLE

Vibration Measurement Equipment

Measurement Equipment

Hardware: B&K Front End Type 3040-A-040

Software: B&K Pulse Labshop2 2 Version

Accelerometer

PCB 393B05

Vibration Measurement Setup

F Span: 200 Hz

Lines: 3200

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

Measurement Summary

Measurement Location	Vibration Specification	Measurement Axis	Measurement Result
Measurement Location	Vibration Specification	Measurement Axis	Floor	DVIA-ML1000
1. Floor 2. DVIA-ML1000	See Section 8	Vertical (Z-axis)	✓ PASS	✓ PASS
		Left to Right (X-axis)	✓ PASS	✓ PASS
		Front to Back (Y-axis)	✓ PASS	✓ PASS

Measurement Data

Vertical (Z-axis)

Z-axis — Autospectrum

Image 1 — Korea Water Resources Corporation (KOWOL) ZEISS GeminiSEM 560 FE-SEM DVIA-ML1000 Installation Report

Z-axis — VC Curves

Image 2 — Korea Water Resources Corporation (KOWOL) ZEISS GeminiSEM 560 FE-SEM DVIA-ML1000 Installation Report

Z-axis — Transmissibility

Image 3 — Korea Water Resources Corporation (KOWOL) ZEISS GeminiSEM 560 FE-SEM DVIA-ML1000 Installation Report

Left to Right (X-axis)

X-axis — Autospectrum

Image 4 — Korea Water Resources Corporation (KOWOL) ZEISS GeminiSEM 560 FE-SEM DVIA-ML1000 Installation Report

X-axis — VC Curves

Image 5 — Korea Water Resources Corporation (KOWOL) ZEISS GeminiSEM 560 FE-SEM DVIA-ML1000 Installation Report

X-axis — Transmissibility

Image 6 — Korea Water Resources Corporation (KOWOL) ZEISS GeminiSEM 560 FE-SEM DVIA-ML1000 Installation Report

Front to Back (Y-axis)

Y-axis — Autospectrum

Image 7 — Korea Water Resources Corporation (KOWOL) ZEISS GeminiSEM 560 FE-SEM DVIA-ML1000 Installation Report

Y-axis — VC Curves

Image 8 — Korea Water Resources Corporation (KOWOL) ZEISS GeminiSEM 560 FE-SEM DVIA-ML1000 Installation Report

Y-axis — Transmissibility

Image 9 — Korea Water Resources Corporation (KOWOL) ZEISS GeminiSEM 560 FE-SEM DVIA-ML1000 Installation Report

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion Curve	Description	Amplitude µm/s (µin/s)	Detail Size µm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.	100 (4,000)	25
VC-A	Adequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment (including steppers) to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.	12.5 (500)	1–3
VC-D	Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.	6.25 (250)	0.1–0.3
VC-E	A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.	3.12 (125)	<0.1
VC-F	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	1.56 (62.5)	N/A
VC-G	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	0.78 (31.3)	N/A

¹ As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

² The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc. It is not relevant to imaging associated with probe technologies, AFMs, and nanotechnology.

The information given in this table is for guidance only. In most instances, it is recommended that the advice of someone knowledgeable about applications and vibration requirements of the equipment and processes be sought.