Installation Report

06-05-2026

Ningbo University of Engineering Hitachi High-Tech FE-SEM SU8600 DVIA-ML1000 Installation Report

DVIA-M Series

Installation Report

Ningbo University of Engineering

Hitachi High-Tech

FE-SEM

SU8600

DVIA-ML1000

250718R2

Ningbo

Overview

The DVIA-ML1000 active vibration isolation platform is appropriately installed and functioning as intended

Vibration Isolation System Information

Model: DVIA-ML1000

Serial Number: 250718R2

Engineer

Juhyeok.kim · DAEIL SYSTEMS

Installation Date

2026.06.05

End User

Ningbo University of Engineering

Number of Tuning Trial

1st

Location

Ningbo · in China

Equipment

Manufacturer: Hitachi High-Tech

Equipment: FE-SEM

Model: SU8600

Tuning Request

Image 1 — Ningbo University of Engineering Hitachi High-Tech FE-SEM SU8600 DVIA-ML1000 Installation Report

Vibration Specification

Table 1-2-2 Allowable vibration

Allowable value (X, Y)

Frequency [Hz]	Amplitude [μm p-p]
1.0	8.0 or less
1.5	3.0 or less
2.0	1.4 or less
2.4	1.4 or less
3.0	3.0 or less
5.0	4.0 or less
6.0	3.5 or less
10.0	3.5 or less

Allowable value (Z)

Frequency [Hz]	Amplitude [μm p-p]
1.0	20 or less
2.0	10 or less
3.0	5.0 or less
4.0	2.7 or less
5.0	1.8 or less
6.0	1.0 or less
7.0	1.0 or less
10.0	1.0 or less

Measurement Summary

Measurement Point	Vibration Specifications	Axis	Result
Measurement Point	Vibration Specifications	Axis	Floor	DVIA-ML1000
1. Floor 2. DVIA-ML1000	See Section 9	Vertical	✗ FAIL	✓ PASS
		Left to Right	✗ FAIL	✓ PASS
		Front to Back	✗ FAIL	✓ PASS

Measurement Data

Vertical

Vertical — Autospectrum

Image 2 — Ningbo University of Engineering Hitachi High-Tech FE-SEM SU8600 DVIA-ML1000 Installation Report

Vertical — VC Curves

Image 3 — Ningbo University of Engineering Hitachi High-Tech FE-SEM SU8600 DVIA-ML1000 Installation Report

Vertical — Transmissibility

Image 4 — Ningbo University of Engineering Hitachi High-Tech FE-SEM SU8600 DVIA-ML1000 Installation Report

Left to Right

Left to Right — Autospectrum

Image 5 — Ningbo University of Engineering Hitachi High-Tech FE-SEM SU8600 DVIA-ML1000 Installation Report

Left to Right — VC Curves

Image 6 — Ningbo University of Engineering Hitachi High-Tech FE-SEM SU8600 DVIA-ML1000 Installation Report

Left to Right — Transmissibility

Image 7 — Ningbo University of Engineering Hitachi High-Tech FE-SEM SU8600 DVIA-ML1000 Installation Report

Front to Back

Front to Back — Autospectrum

Image 8 — Ningbo University of Engineering Hitachi High-Tech FE-SEM SU8600 DVIA-ML1000 Installation Report

Front to Back — VC Curves

Image 9 — Ningbo University of Engineering Hitachi High-Tech FE-SEM SU8600 DVIA-ML1000 Installation Report

Front to Back — Transmissibility

Image 10 — Ningbo University of Engineering Hitachi High-Tech FE-SEM SU8600 DVIA-ML1000 Installation Report

Equipment picture

Image 11 — Ningbo University of Engineering Hitachi High-Tech FE-SEM SU8600 DVIA-ML1000 Installation Report

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion Curve	Description of Use	Amplitude(μm/s RMS)	Detail Size(μm)
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.	200	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.	100	25
VC-A	Adequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.	50	8
VC-B	Appropriate for inspection and lithography equipment (including steppers) to 3μm line widths.	25	3
VC-C	Appropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.	12.5	1–3
VC-D	Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.	6.25	0.1–0.3
VC-E	A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems. E-Beam lithography systems working at nanometer scales and other systems requiring extraordinary dynamic stability.	3.12	< 0.1
VC-F	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	1.56	N/A
VC-G	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	0.78	N/A

1. As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

2. The detail size refers to line width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc.

3. The detail size is not relevant to imaging associated with probe technologies, AFMs, and nanotechnology.