Installation Report

DVIA-M Series

12-09-2025

YIMO Hitachi FE-SEM SU8600 DVIA-ML1000 (250822R5) Installation Report

DVIA-M Series

Installation Report

YIMO

Hitachi

FE-SEM

SU8600

DVIA-ML1000

Overview

The DVIA-ML1000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Info

Model: DVIA-ML1000

Serial Number: 250822R5

Engineer

Chaewon Lee DAEIL SYSTEMS

Tuning Date

December 04, 2025

Report written date

December 09, 2025

End User

N/A

Number of Tuning Trial

1st

Location

N/A

Equipment

Manufacturer: Hitachi

Equipment: FE-SEM

Model: SU8600

Vibration specification

N/A

Equipment Condition

The equipment is turned on/IDLE

Tuning Request

N/A

Measurement Summary

Status	Axis	Floor	On DVIA-ML1000
SU8600 is turned on/IDLE	Vertical	VC-D @ 31.5 Hz	VC-G @ 31.5 Hz
	Left to Right	VC-F @ 1.25 Hz	VC-G @ 1.25 Hz
	Front to Back	VC-E @ 4 Hz	VC-G @ 4 Hz

Data and Image

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Equipment picture

Reference

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A