Installation Report

DVIA-M Series

06-22-2026

YIMO TECH Epin Instruments Technology STM DVIA-MO1000 Installation Report

DVIA-M Series

Installation Report

YIMO TECH

Epin Instruments Technology

STM

E-frequency

DVIA-MO1000

241101R2

Shanghai

Overview

The DVIA-MO1000 active vibration isolation platform is appropriately installed and functioning as intended

Vibration Isolation System Information

Model: DVIA-MO1000

Serial Number: 241101R2

Engineer

Juhyeok.kim · DAEIL SYSTEMS

Installation Date

2026.06.22

Report Written Date

2026.06.22

End User

Epin Instruments Technology Co., Ltd.

Number of Tuning Trial

2st

Location

Shanghai

Equipment

Manufacturer: STM-

Model: E-frequency

Tuning Request

N/A

Vibration Specification

No official vibration specification defined.

Measurement Summary

Measurement Point	Vibration Specifications	Axis	Result
Measurement Point	Vibration Specifications	Axis	Floor	DVIA-ML1000
1. Floor 2. DVIA-ML1000	See Section9	Vertical	VC-C	VC-F
		Left to Right	VC-F	VC-G
		Front to Back	VC-E	VC-G

Measurement Data

Vertical Autospectrum

Vertical VC Curves

Vertical Transmissibility

Left to Right Autospectrum

Left to Right VC Curves

Left to Right Transmissibility

Front to Back Autospectrum

Front to Back VC Curves

Front to Back Transmissibility

Equipment picture

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion Curve	Description of Use	Amplitude (μm/s RMS)	Detail Size (μm)
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.	200	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.	100	25
VC-A	Adequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.	50	8
VC-B	Appropriate for inspection and lithography equipment (including steppers) to 3μm line widths.	25	3
VC-C	Appropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.	12.5	1–3
VC-D	Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.	6.25	0.1–0.3
VC-E	A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems. E-Beam lithography systems working at nanometer scales and other systems requiring extraordinary dynamic stability.	3.12	< 0.1
VC-F	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	1.56	N/A
VC-G	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	0.78	N/A

Notes:

1. As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

2. The detail size refers to line width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc.

3. The detail size is not relevant to imaging associated with probe technologies, AFMs, and nanotechnology.

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