Installation Report

01-14-2025

Epin Shanghai STM DVIA-MO1000 (240930R7) Installation Report — January 14, 2025

DVIA-M Series

Installation Report

Epin

STM

DVIA-MO1000

Overview

The DVIA-MO1000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-MO1000

Serial Number: 240930R7

Engineer

Chaewon Lee, Jonghwa Suh from DAEIL SYSTEMS

Tuning Date

January 14, 2025

Report written date

January 14, 2025

End User

Epin

Number of Tuning Trial

1st tuning

Location

Shanghai, China

Equipment

Manufacturer: Epin

Equipment: STM

Model: N/A

Equipment Condition

The equipment is installed / Turned off

Tuning Request

Image 1 — Epin Shanghai STM DVIA-MO1000 (240930R7) Installation Report — January 14, 2025

Data and Image

Vertical Transmissibility

Image 2 — Epin Shanghai STM DVIA-MO1000 (240930R7) Installation Report — January 14, 2025

Left to Right Transmissibility

Image 3 — Epin Shanghai STM DVIA-MO1000 (240930R7) Installation Report — January 14, 2025

Front to Back Transmissibility

Image 4 — Epin Shanghai STM DVIA-MO1000 (240930R7) Installation Report — January 14, 2025

Equipment picture

Image 5 — Epin Shanghai STM DVIA-MO1000 (240930R7) Installation Report — January 14, 2025

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude µm/s (µin/s)	Detail Size µm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

1. As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

2. Detail size refers to width in microelectronics fabrication or particle size in medical research.

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