Installation Report

DVIA-M Series

05-15-2026

TESCAN SOLARIS GMH DVIA-M1000 (230501R3-1) Installation Report

DVIA-M Series

Installation Report

PXW

TESCAN

SOLARIS GMH

Shenzhen

DVIA-M1000

230501R3-1

(M1000_ 230501R3-1 Set up)

Target equipment

TESCAN SOLARIS GMH

Place of installation

Shenzhen

Remark

Good Performance

END USER

PXW

Operator

Operator: Park, Jongwon Date of setup: 23.09.19 Date of reporting: 23.09.19

Date of business trip

Date of business trip : 17.12.27~17.12.29

Overview

Overview The DVIA-M1000 active vibration isolation platform is appropriately installed and functioning as intended. Measurement date: 2023.09.19 (Tuesday) Operator: DAEIL SYSTEMS Jongwon Park Place of measurement: Shenzhen Equipment Model: TESCAN SOLARIS GMH

M1000 internal program performance measurement result

Z axis

X axis

Y axis

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

1. As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

2. Detail size refers to width in microelectronics fabrication or particle size in medical research.

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