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Installation Report
DVIA-M Series
05-16-2026

ZEISS Crossbeam 550 DVIA-MB1000 (221012R4) Installation Report

DVIA-M Series
Installation Report
ZEISS
Crossbeam 550
DVIA-MB1000
Pukyong National University

Contents

Overview

The DVIA-MB1000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-MB1000

Serial Number: 221012R4

Engineer

Sangjae Lee from DAEIL SYSTEMS

Tuning Date

February 9, 2023

Report written date

February 10, 2023

Date of business trip

17.12.27~17.12.29

End User

N/A

Number of Tuning Trial

N/A

Location

Pukyong National University, China

Equipment

Manufacturer: ZEISS

Model: Crossbeam 550

Data and Image

Z-axis (Vertical) Transmissibility

Z-axis (Vertical) VC curve — Floor Z

Z-axis (Vertical) VC curve — Top Z

X-axis (Left to Right) Transmissibility

X-axis (Left to Right) VC curve — Floor X

X-axis (Left to Right) VC curve — Top X

Y-axis (Front to Back) Transmissibility

Y-axis (Front to Back) VC curve — Floor Y

Y-axis (Front to Back) VC curve — Top Y

Equipment picture

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date05-16-2026
Tags
DVIA-M Series
Installation Report
ZEISS
Crossbeam 550
DVIA-MB1000
Pukyong National University

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