SNU Precision DUAL BEAM DVIA-MB1000 (220216R3) Installation Report

DVIA-M Series

Installation Report

SNU Precision

DUAL BEAM

DVIA-MB1000

Overview

The DVIA-MB1000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-MB1000

Serial Number: 220216R3

Engineer

Youngha Lee and Sangjae Lee from DAEIL SYSTEMS

Tuning Date

December 21, 2022

Report written date

December 22, 2022

Date of business trip : 17.12.27~17.12.29

End User

SNU Precision

Location

SNU Precision headquarters C/R, Asan

Equipment

Equipment name: DUAL BEAM

Measurement Device

7.1) Data Physics

Hardware: Quattro, Serial Number: 22436

Software: SignalCalc ACE

7.2) Measurement Setting

Bandwidth: 0 – 80 Hz

Lines: 800

Window: Hanning

Averaging: FFT Spectrum Averaging

Engineering Units: m/s^2

7.3) Sensor

PCB Accelerometer

Model: 393B05

Measurement Summary

Measurement site	VC curves	Z-axis (Vertical) 1-10 Hz	Z-axis (Vertical) 12.5-80 Hz	X-axis (Left to Right) 1-10 Hz	X-axis (Left to Right) 12.5-80 Hz	Y-axis (Front to Back) 1-10 Hz	Y-axis (Front to Back) 12.5-80 Hz
Floor		F	F	F	G	F	G
Top plate		G	G	G	G	G	G

Data and Image

Z-axis (Vertical) Floor VC Curve

Z-axis (Vertical) Active VC Curve

X-axis (Left to Right) Floor VC Curve

X-axis (Left to Right) Active VC Curve

Y-axis (Front to Back) Floor VC Curve

Y-axis (Front to Back) Active VC Curve

Transmissibility

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A