Installation Report

DVIA-M Series

06-22-2022

Thermo Scientific Axia DVIA-M1000 Installation Report (Jiaxing, 220106R9, 2022-06-22)

DVIA-M Series

Installation Report

DVIA-M1000

Thermo Scientific

Axia

Jiaxing

220106R9

China

Internal program

End user (cover)

浙江长盛滑动轴承股份有限公司 / ZHEJIANG CHANGSHENG SLIDING BEARING CO., LTD

Platform title

(M1000_ 220106R9 Set up)

Set-up title graphic

Target equipment

thermoscientific Axia

Place of installation

Jiaxing, China

Remark

Good Performance

End user (table)

Zhejiang Changsheng Sliding Bearing Co. Ltd.（浙江长盛滑动轴承股份有限公司）

Operator

Yu, Ho Sang

Date of setup

22.06.22

Date of reporting

22.06.22

Date of business trip

17.12.27~17.12.29

Overview

The DVIA-M1000 active vibration isolation platform is appropriately installed and functioning as intended.

Measurement date

2022.06.22 (Wednesday),

Operator (measurement)

DAEIL SYSTEMS, Hosang Yu

Place of measurement

jiaxing, China

Equipment model

thermoscientific Axia

Measurement conditions and results

Summary of measurement results

Test Condition

VC-Class

	Z	X	Y
Floor	B	B	B
Above Active	F	E	F

Good omnidirectional performance.

MB1000 internal program performance measurement result

Z axis

X axis

Y axis

Octave Band Result

Z axis

X axis

Y axis

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A