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Installation Report
DVIA-M Series
04-10-2018

Fudan University MC1000 (P76) Bruker UltraShield 500 NMR performance report — 2018-04-10

DVIA-M Series
Performance report
MC1000
P76
Bruker
NMR
Fudan University
Pudan University
DAEIL SYSTEMS

Contents

Pudan Univ (MC1000_P76 Set up)

Target equipmentBRUKER ULTRA SHIELD 500 NMR
Place of installationPudan UNIV, Basement 1FLOOR
UniquenessGood Performance
END USERPudan Univ
Date of business trip : 18.03.30Business traveler: Choi, HyoungMun
Date Created : 18.04.10

Overview

After Active mounting, measure the vibration environment to check that there is no problem in using the equipment.

Measurement information

Measurement date: 2018.03.30 (Friday), Rater: Daeil System, Manager Choi , Hyoung Moon

Place of measurement : Pudan UNIV, Basement 1FLOOR

Equipment Model: BRUKER ULTRA SHIELD 500 NMR

Measurement conditions and results

Summary of measurement results

Test ConditionZXY
FloorDEE
Above ActiveGGG

Good omnidirectional performance and attached VC-Class graph.

VC-Class graph

MB1000 internal program performance measurement result

Z axis - internal program

X axis - internal program

Y axis - internal program

Octave Band Result (BASE: Floor, TOP: Above Active)

Z axis - octave band result

X axis - octave band result

Y axis - octave band result

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm line widths.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

2. Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date04-10-2018
Tags
DVIA-M Series
Performance report
MC1000
P76
Bruker
NMR
Fudan University
Pudan University
DAEIL SYSTEMS

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