Installation Report

DVIA-P Series

04-14-2023

Tier-1 Semiconductor Advanced Institute Suwon NIKON stepper DVIA-P7000 Installation Report

DVIA-P Series

Installation Report

Tier-1 Semiconductor Advanced Institute

NIKON

stepper

DVIA-P7000

140416R6

Overview

The DVIA-P7000 active vibration isolation platform is appropriately installed and functioning as intended.

System Information

Model: DVIA-P7000

Serial Number: 140416R6

Engineer

Youngha Lee from DAEIL SYSTEMS

Tuning Date

April 14, 2023

Location

Tier-1 Semiconductor Advanced Institute, Suwon

Equipment

NIKON, stepper

Prepared by

Engineer: Youngha Lee

Tuning date: 23.04.14

Report written date: 23.04.24

Date of business trip : 17.12.27~17.12.29

Summary of Vibration Results

Measurement Point	VC curves	Z-axis (Vertical) 1-10 Hz	Z-axis (Vertical) 12.5-80 Hz	X-axis (Left to Right) 1-10 Hz	X-axis (Left to Right) 12.5-80 Hz	Y-axis (Front to Back) 1-10 Hz	Y-axis (Front to Back) 12.5-80 Hz
Floor		E	A+	F	A	A+	C
Active		D	C	D	E	C	C

Data and Image

Z-axis (Vertical) Transmissibility

Z-axis (Vertical) VC curves

Floor

Active

X-axis (Left to Right) Transmissibility

X-axis (Left to Right) VC curves

Floor

Active

Y-axis (Front to Back) Transmissibility

Y-axis (Front to Back) VC curves

Floor

Active

Required vibration specifications of equipment

1~45Hz : VC-A

45~65Hz : VC-B

65~130Hz : VC-C

130Hz~200Hz : VC-D

Reference

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Tier-1 Semiconductor Advanced Institute Suwon NIKON stepper DVIA-P7000 Installation Report

Contents

Overview

System Information

Engineer

Tuning Date

Location

Equipment

Prepared by

Summary of Vibration Results

Data and Image

Z-axis (Vertical) Transmissibility

Z-axis (Vertical) VC curves

Floor

Active

X-axis (Left to Right) Transmissibility

X-axis (Left to Right) VC curves

Floor

Active

Y-axis (Front to Back) Transmissibility

Y-axis (Front to Back) VC curves

Floor

Active

Required vibration specifications of equipment

Reference

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Case Study Information

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