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Installation Report
09-21-2026

ZEISS FE-SEM Sigma 360 DVIA-ULF700 Installation Report

DVIA-ULF Series
Installation Report
Hubei Jinquan
ZEISS
FE-SEM
Sigma 360
DVIA-ULF700
260605R7
Hubei

Overview

Following the installation of the DVIA-ULF700 in Hubei, tuning and vibration measurement were performed. This was the 2nd tuning, carried out at the customer's request after the initial tuning on 2026.09.08. Vibration measurement was conducted with the equipment in the Idle state. Measurement data is presented as autospectrum plots for each axis (Vertical, Left to Right, Front to Back), and reference material on vibration levels is provided in Section 16.

Vibration Isolation System Information

Model: DVIA-ULF700

Serial Number: 260605R7

Engineer

Taehun Kim · DAEIL SYSTEMS

Tuning Date

2026.09.21

End User

Hubei Jinquan

Number of Tuning Trial

2nd

Site

Hubei

Equipment

Manufacturer: ZEISS

Equipment: FE-SEM

Model: Sigma 360

Vibration Specification

Horizontal

Frequency [Hz]Allowable [mm/s² RMS]
10.04
100.04
100.17
200.17
200.3
700.3
702
1002

Vertical

Frequency [Hz]Allowable [mm/s² RMS]
10.03
80.03
80.15
450.15
452
1002

Equipment Condition

Idle

Tuning Request

Conclusion

During the initial tuning on 2026.09.08, the system did not achieve satisfactory isolation performance. At the customer's request, a 2nd tuning was performed on 2026.09.21, and the vibration levels on the DVIA-ULF700 met the specification on all three axes (Vertical, Left to Right, Front to Back). The floor vibration exceeded the specification on all axes.

A photo comparison of the two tuning sessions indicates that the passive setup was readjusted. In particular, the spring compression appears more evenly distributed across the four support points. This suggests the load was shared more uniformly between the supports.

Because spring stiffness varies with compression, the stiffness at all four support points must be balanced appropriately. The previous setup likely did not achieve this. The improved passive setup is therefore presumed to have reduced interference with the active control band, which improved overall isolation performance.

To maintain this performance, it is recommended that the current passive setup, including spring compression and load distribution, be preserved. It should be rechecked if the equipment is relocated or its payload changes.

Measurement Summary

Measurement PointVibrationSpecificationsAxisResult
FloorDVIA-ULF700
1. Floor
2. DVIA-ULF700
See Section 9Vertical✗ FAIL✓ PASS
Left to Right✗ FAIL✓ PASS
Front to Back✗ FAIL✓ PASS

Measurement Data Obtained via UI Program

Vertical

Vertical — Autospectrum

Left to Right

Left to Right — Autospectrum

Front to Back

Front to Back — Autospectrum

Installation Photo

Equipment

Passive 1

Passive 2

Passive 3

Passive 4

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion CurveDescriptionAmplitude
(μm/s) (μin/s)
Detail Size
(μm)
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.100 (4,000)25
VC-AAdequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment (including steppers) to 3μm line widths.25 (1,000)3
VC-CAppropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.12.5 (500)1-3
VC-DSuitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.6.25 (250)0.1-0.3
VC-EA challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.3.12 (125)<0.1
VC-FAppropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.1.56 (62.5)N/A
VC-GAppropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.0.78 (31.3)N/A

Notes:

1. As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

2. The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc. It is to imaging associated with probe technologies, AFMs, and nanotechnology.

The information given in this table is for guidance only. In most instances, it is recommended that the advice of someone knowledgeable about applications and vibration requirements of the equipment and processes be sought.

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Case Study Information

Category
Installation Report
Date09-21-2026
Tags
DVIA-ULF Series
Installation Report
Hubei Jinquan
ZEISS
FE-SEM
Sigma 360
DVIA-ULF700
260605R7
Hubei