Installation Report

08-20-2026

YIMOTECH ZEISS Sigma 360 FE-SEM DVIA-ULF700 Installation Report

DVIA-ULF Series

Installation Report

YIMOTECH

Jiechuang Trading

ZEISS

Sigma 360

FE-SEM

DVIA-ULF700

260511R3

Shanghai

Overview

Following the installation of DVIA-ULF700 at Shanghai, tuning and vibration measurement were performed.

Vibration measurement was conducted with the equipment in the Idle state.

Data is represented in VC Curve format and reference material on the vibration level is provided.

Vibration Isolation System Information

Model: DVIA-ULF700

Serial Number: 260511R3

Engineer

Taehun Kim · DAEIL SYSTEMS

Tuning Date

2026.08.20

End User

Jiechuang Trading

Number of Tuning Trial

1st

Site

Shanghai

Equipment

Manufacturer: ZEISS

Equipment: FE-SEM

Model: Sigma 360

Vibration Specification

Horizontal

Frequency [Hz]	Allowable [mm/s² RMS]
1	0.04
10	0.04
10	0.17
20	0.17
20	0.3
70	0.3
70	2
100	2

Vertical

Frequency [Hz]	Allowable [mm/s² RMS]
1	0.03
8	0.03
8	0.15
45	0.15
45	2
100	2

Equipment Condition

Idle

Tuning Request

Image 1 — YIMOTECH ZEISS Sigma 360 FE-SEM DVIA-ULF700 Installation Report

Conclusion

Vibration measurements were performed at two positions the installation floor and the top surface of the DVIA-ULF700 active vibration isolation system and evaluated against the criteria defined in Section 9.

At the floor level, the vertical axis did not satisfy the specified criterion, while the horizontal axes (left-to-right and front-to-back) remained within the allowable limits. This indicates that the ambient floor condition alone is not adequate to support the operating requirements of the installed equipment.

Following installation of the DVIA-ULF700, all three axes measured on the isolation system satisfy the specified criteria. The vertical-axis exceedance observed at the floor is fully attenuated by the isolation system, and the horizontal axes maintain compliant levels. These results confirm that the DVIA-ULF700 effectively compensates for the deficiency in the site's ambient vibration environment.

Measurement Summary

Measurement Point	VibrationSpecifications	Axis	Result
Measurement Point	VibrationSpecifications	Axis	Floor	DVIA-ULF700
1. Floor 2. DVIA-ULF700	See Section 9	Vertical	✗ FAIL	✓ PASS
		Left to Right	✓ PASS	✓ PASS
		Front to Back	✓ PASS	✓ PASS

Measurement Data Obtained via UI Program

Vertical — Autospectrum

Image 2 — YIMOTECH ZEISS Sigma 360 FE-SEM DVIA-ULF700 Installation Report

Left to Right — Autospectrum

Image 3 — YIMOTECH ZEISS Sigma 360 FE-SEM DVIA-ULF700 Installation Report

Front to Back — Autospectrum

Image 4 — YIMOTECH ZEISS Sigma 360 FE-SEM DVIA-ULF700 Installation Report

Installation Photo

Image 5 — YIMOTECH ZEISS Sigma 360 FE-SEM DVIA-ULF700 Installation Report

Image 6 — YIMOTECH ZEISS Sigma 360 FE-SEM DVIA-ULF700 Installation Report

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion Curve	Description	Amplitude (μm/s) (μin/s)	Detail Size (μm)
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.	100 (4,000)	25
VC-A	Adequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment (including steppers) to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.	12.5 (500)	1-3
VC-D	Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.	6.25 (250)	0.1-0.3
VC-E	A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.	3.12 (125)	<0.1
VC-F	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	1.56 (62.5)	N/A
VC-G	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	0.78 (31.3)	N/A

Notes:

1. As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

2. The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc. It is to imaging associated with probe technologies, AFMs, and nanotechnology.

The information given in this table is for guidance only. In most instances, it is recommended that the advice of someone knowledgeable about applications and vibration requirements of the equipment and processes be sought.

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