Greater Bay Area Quantum Center ZEISS Sigma 360 DVIA-ULF700 Installation Report

DVIA-ULF Series

Installation Report

Greater Bay Area Quantum Center

ZEISS

Sigma 360

FE-SEM

DVIA-ULF700

251110R7

Overview

Following the installation of DVIA-ULF700 at Quantum Science Center of Guangdong-Hong Kong-Macao Greater Bay Area China, vibration measurement was performed.

Vibration measurement was conducted with the equipment in the IDLE state.

Data is represented in Autospectrum format, and reference material on the vibration level is provided.

Vibration Isolation System Information

Model: DVIA-ULF700

Serial Number: 251110R7

Engineer

Juhyeok.KIM · DAEIL SYSTEMS

Installation Date

2026.03.21

End User

Greater Bay Area Quantum Center

Number of Tuning Trial

1st

Site

Guangdong in China

Equipment

Manufacturer: ZEISS

Equipment: FE-SEM

Model: Sigma 360

Vibration Specification

Vertical

Frequency [Hz]	Allowable [mm/s²]
1~8	0.03
8~45	0.15
45~	2.0

Horizontal

Frequency [Hz]	Allowable [mm/s²]
1~10	0.04
10~20	0.17
20~70	0.30
70~	2.00

Measurement Summary

Measurement Point	Vibration Specifications	Axis	Floor	DVIA-ULF700
1. Floor 2. DVIA-ULF700	See Section 9	Vertical	✗ FAIL	✓ PASS
		Left to Right	✓ PASS	✓ PASS
		Front to Back	✗ FAIL	✓ PASS

Measurement Data

Vertical — Autospectrum

Left to Right — Autospectrum

Front to Back — Autospectrum

Installation Photo

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion Curve	Description	Amplitude (μm/s) (μin/s)	Detail Size (μm)
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.	100 (4,000)	25
VC-A	Adequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment (including steppers) to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.	12.5 (500)	1-3
VC-D	Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.	6.25 (250)	0.1-0.3
VC-E	A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.	3.12 (125)	< 0.1
VC-F	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	1.56 (62.5)	N/A
VC-G	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	0.78 (31.3)	N/A

Notes:

1. As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

2. The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc. It is to imaging associated with probe technologies, AFMs, and nanotechnology.