ZEISS FE-SEM Sigma 360 DVIA-ML1000 Installation Report
Contents
Overview
Following the installation of DVIA-ML1000 at Wuhan, tuning and vibration measurement were performed.
Vibration measurement was conducted with the equipment in the IDLE state.
Data is represented in Autospectrum format and reference material on the vibration level is provided.
Vibration Isolation System Information
Model: DVIA-ML1000
Serial Number: 260517R3
Engineer
Taehun KIM · DAEIL SYSTEMS
Tuning Date
2026.10.13
End User
Wuhan University of Science and Technology
Number of Tuning Trial
1st
Site
Wuhan
Equipment
Manufacturer: ZEISS
Equipment: FE-SEM
Model: Sigma 360
Vibration Specification
Horizontal
| Frequency [Hz] | Allowable [mm/s² RMS] |
|---|---|
| 1 ~ 10 | 0.04 |
| 10 ~ 20 | 0.17 |
| 20~ 70 | 0.3 |
| 70 ~ | 2 |
Vertical
| Frequency [Hz] | Allowable [mm/s² RMS] |
|---|---|
| 1 ~ 8 | 0.03 |
| 8 ~ 45 | 0.15 |
| 45 ~ | 2 |
Equipment Condition
IDLE
Conclusion
Following installation and tuning of the DVIA-ML1000 (S/N 260517R3) at the Wuhan University of Science and Technology, vibration was measured on the floor and on the isolator with the ZEISS Sigma360 in the IDLE state.
As shown in Section 13, the vibration measured on the DVIA-ML1000 meets the specification (Section 9) in all three axes (Vertical, Left to Right, Front to Back).
Measurement Summary
| Measurement Point | Vibration Specifications | Axis | Result | |
|---|---|---|---|---|
| Floor | DVIA-ML1000 | |||
| 1. Floor 2. DVIA-ML1000 | See Section 9 | Vertical | ✗ FAIL | ✓ PASS |
| Left to Right | ✓ PASS | ✓ PASS | ||
| Front to Back | ✗ FAIL | ✓ PASS | ||
Measurement Data Obtained via UI Program
Vertical
Vertical — Autospectrum
Left to Right
Left to Right — Autospectrum
Front to Back
Front to Back — Autospectrum
Installation Photo
Equipment
Reference
The table below classifies vibration levels based on IEST-RP-CC012.2.
¹ As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).
² The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc. It is not relevant to imaging associated with probe technologies, AFMs, and nanotechnology.
The information given in this table is for guidance only. In most instances, it is recommended that the advice of someone knowledgeable about applications and vibration requirements of the equipment and processes be sought.
