Installation Report

DVIA-M Series

12-09-2025

Wuxi YIDONG YF-1801 FE-SEM DVIA-ML1000 Installation Report (2025-12-09)

DVIA-M Series

Installation Report

YIDONG

YF-1801

FE-SEM

Wuxi

DVIA-ML1000

Overview

DVIA-ULF1000 was replaced with DVIA-ML1000 due to persistent image instability.

The DVIA-ML1000 is appropriately installed and functioning as intended. 1st tuning for Serial 250912R5; YIDONG YF-1801 FE-SEM in Wuxi, China; end user: Huasheng Lianying Vibration Damping Platform. Equipment on/IDLE.

Vibration Isolation System Information

Model: DVIA-ML1000 — Serial: 250912R5

Engineer

Chaewon Lee — DAEIL SYSTEMS

Tuning date

December 9, 2025

Report written date

December 9, 2025

End user

Huasheng Lianying Vibration Damping Platform

Number of tuning trial

1st

Location

Wuxi, China

Equipment

Manufacturer: YIDONG — FE-SEM — Model: YF-1801

Equipment condition

The equipment is on/IDLE

Tuning request

N/A

Data and Image

Vertical Transmissibility

Left to Right Transmissibility

Front to Back Transmissibility

Equipment picture

— Not included in this web package.

Vertical Transmissibility

Left to Right Transmissibility

Front to Back Transmissibility

Equipment picture

Reference

— Use the shared VC table in the Reference block below.

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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