YIMOTECH ZEISS EVO 10 SEM DVIA-U1000 Installation Report (2nd Tuning)

DVIA-U Series

Installation Report

YIMOTECH

Shanghai Tight Welding Institute

ZEISS

EVO 10

SEM

DVIA-U1000

241217R6

Shanghai

Overview

Following the installation of DVIA-U1000 at Sanghai, tuning and vibration measurement were performed.

Vibration measurement was conducted with the equipment in the Turned off state.

Data is represented in VC Curve format and reference material on the vibration level is provided.

Vibration Isolation System Information

Model: DVIA-U1000

Serial Number: 241217R6

Engineer

Taehun KIM · DAEIL SYSTEMS

Tuning Date

2026.08.04

End User

Sanghai Jinhansuo (上海紧焊所)

Number of Tuning Trial

2nd

Site

Sanghai

Equipment

Manufacturer: ZEISS

Equipment: SEM

Model: EVO 10

Equipment Condition

Turned off

Tuning Request

Measurement Data Obtained via UI Program

Vertical — Transmissibility

Left to Right — Transmissibility

Front to Back — Transmissibility

Installation Photo

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion Curve	Description	Amplitude (μm/s) (μin/s)	Detail Size (μm)
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.	100 (4,000)	25
VC-A	Adequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment (including steppers) to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.	12.5 (500)	1-3
VC-D	Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.	6.25 (250)	0.1-0.3
VC-E	A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.	3.12 (125)	<0.1
VC-F	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	1.56 (62.5)	N/A
VC-G	Appropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.	0.78 (31.3)	N/A

Notes:

1. As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

2. The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc. It is to imaging associated with probe technologies, AFMs, and nanotechnology.

The information given in this table is for guidance only. In most instances, it is recommended that the advice of someone knowledgeable about applications and vibration requirements of the equipment and processes be sought.