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Installation Report
DVIA-P Series
10-29-2024

Korea Institute of Nanotechnology JEOL JBX-8100FS DVIA-P2200 Installation Report

DVIA-P Series
Installation Report
Korea Institute of Nanotechnology
KINTI
JEOL
JBX-8100FS
240705R1

Overview

Tuning and vibration measurement were performed on the DVIA-P2200 installed at Korea Institute of Nanotechnology.

Vibration measurement and tuning were conducted with the equipment Turned on/IDLE.

The DVIA-P2200 was connected to a laptop; feedback and feedforward tuning via UI software and vibration measurement with Data Physics equipment were performed for performance inspection.

Data are presented as VC curves, with reference materials on vibration levels.

Vibration Isolation System Information

Model: DVIA-P2200

Serial Number: 240705R1

Engineer

Chaewon Lee from DAEIL SYSTEMS

Measurement Date

October 29, 2024

Installation Site

Korea Institute of Nanotechnology 2F Nano Reso/Pattern Support Line

End User

Korea Institute of Nanotechnology

Equipment Information

Manufacturer: JEOL

Equipment: Electron Beam Lithography

Model: JBX-8100FS

Equipment Photo

Equipment vibration specification

Equipment Status

설치완료/Turned on

Tuning count

1 time

Measuring Equipment

11.1) Data Physics

Hardware: QUATTRO, Serial Number: 22436

Software: SignalCalc ACE

11.2) Accelerometer

PCB Accelerometer

Model: 393B05

Measuring Set-up

F Span: 200

Lines: 3200

Window: Hanning

Averaging: FFT Spectrum Averaging

Engineering Units: m/s

Conclusion

Large vibration occurs near 40 Hz and 78 Hz at the control unit installed on the equipment. Especially at 78 Hz, vibration exceeding VC-A magnitude is measured. Comparing vibration graphs of the control unit and isolator top plate shows vibration at 78 Hz originates from the control unit. Excessive vibration on top of the isolator is difficult to isolate.

Vertical, Left to Right, and Front to Back all satisfy equipment vibration specification in all bands except 78 Hz.

Measurement Data

Measuring siteEquipment statusDirectionEquipment specMeasuring dataResult
FloorDVIA-P2200FloorDVIA-P2200
Location: Nano/Reso-Pattern Support Line
1. Lower pad
2. DVIA-P2200
설치완료
/Turned on
Vertical1.13E-05 m/s – 1.70E-06
@ 16 Hz - 100 Hz
VC-E
@ 63 Hz
VC-G
@ 63 Hz
PASSPASS
Left to Right1.13E-05 m/s – 1.70E-06
@ 16 Hz - 100 Hz
VC-G
@ 80 Hz
VC-D
@ 80 Hz
PASSFAIL
Front to Back1.13E-05 m/s – 1.70E-06
@ 16 Hz - 100 Hz
VC-G
@ 80 Hz
VC-D
@ 80 Hz
PASSFAIL

Data and Image

Vertical VC Curves

Vertical Narrowband

Vertical Transmissibility

Left to Right VC Curves

Left to Right Narrowband

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Narrowband

Front to Back Transmissibility

Control Unit VC Curves

Control Unit Narrowband

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-P Series
Date10-29-2024
Tags
DVIA-P Series
Installation Report
Korea Institute of Nanotechnology
KINTI
JEOL
JBX-8100FS
240705R1