ETRI JEOL JBX-8100FS DVIA-P2200 Installation Report

DVIA-P Series

Installation Report

ETRI

JEOL

JBX-8100FS

DVIA-P2200

230518R9

Overview

The DVIA-P2200 active vibration isolation platform is appropriately installed and functioning as intended.

Model: DVIA-P2200

Serial Number: 230518R9

Youngha Lee from DAEIL SYSTEMS

Report written date: 23.10.15

Date of business trip: 17.12.27~17.12.29

September 28, 2023

한국전자통신연구원 C/R 1F, Daejeon

JBX-8100FS

Measurement Point	Z-axis (Vertical) 1-10 Hz	Z-axis (Vertical) 12.5-80 Hz	X-axis (Left to Right) 1-10 Hz	X-axis (Left to Right) 12.5-80 Hz	Y-axis (Front to Back) 1-10 Hz	Y-axis (Front to Back) 12.5-80 Hz
Floor	E	C	E	D	E	C
Active	G	E	G	F	G	E

Floor: Access Floor 아래 H beam 진동 측정

Active: DVIA-P2200 상판 패드 진동 측정

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A