Skip to main content
Installation Report
DVIA-P Series
05-21-2026

Korea Nano Technology Institute JEOL JBX-8100FS DVIA-P2200 Installation Report

DVIA-P Series
Installation Report
Korea Nano Technology Institute
JEOL
JBX-8100FS
DVIA-P2200

Overview

Tuning and vibration measurement were performed on the DVIA-P2200 installed at Korea Nano Technology Institute.

Vibration measurement and tuning were performed with the equipment Turned on/IDLE.

During tuning and vibration measurement on 24.10.29, a frequency band fell out of spec due to 78 Hz vibration from the equipment Control Unit. During this tuning and vibration measurement, the Control Unit was Turned off.

Data are presented as VC curves, along with reference materials for vibration level assessment.

Vibration Isolation System Information

Model: DVIA-P2200

Serial Number: 240705R1

Engineer

Chaewon Lee, Jonghwa Seo from DAEIL SYSTEMS

Measurement Date

January 10, 2025

Installation Site

Korea Nano Technology Institute 2F Nano Litho/Pattern Support Line

End User

Korea Nano Technology Institute

Equipment Status

장비설치/IDLE

Equipment Information

Manufacturer: JEOL

Equipment: Electron Beam Lithography

Model: JBX-8100FS

Vibration specification

no HWL - V : VC-F, H: VC-G

With HWL - V : VC-E, H: VC-F

Measuring Equipment

10.1) Data Physics DAQ

-Hardware: QUATTRO, Serial Number: 22436

-Software: SignalCalc ACE

10.2) Accelerometer

PCB Accelerometer

Model: 393B05

Measuring Set-up

F Span: 200

Lines: 3200

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

Average Mode: Exponential, 40

Conclusion

Vibration specifications are satisfied in all directions.

Measurement Data

Measuring PointStatusDirectionEquipment SpecLower PadDVIA-P2200Lower PadDVIA-P2200
Nano/Litho Pattern Support Line
1. Lower Pad
2. DVIA-P2200
Equipment Turned on/IDLEVertical1.13E-05 m/s – 1.70E-06 m/s @ 16 Hz - 100 HzVC-E @ 63 HzVC-G @ 63 HzPASSPASS
Left to Right1.13E-05 m/s – 1.70E-06 m/s @ 16 Hz - 100 HzVC-E @ 20 HzVC-G @ 20 HzPASSPASS
Front to Back1.13E-05 m/s – 1.70E-06 m/s @ 16 Hz - 100 HzVC-E @ 63 HzVC-G @ 63 HzPASSPASS

Data and Image

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC Curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospecturm

Front to Back Transmissibility

Equipment Photo

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

Share this Case Study

Case Study Information

Category
Installation Report
SeriesDVIA-P Series
Date05-21-2026
Tags
DVIA-P Series
Installation Report
Korea Nano Technology Institute
JEOL
JBX-8100FS
DVIA-P2200