Installation Report

05-11-2026

DVIA-MB1000 (240327R3) ZEISS GeminiSEM 360 Installation Report

DVIA-M Series

Installation Report

ZEISS

GeminiSEM 360

DVIA-MB1000

Overview

The DVIA-MB1000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-MB1000

Serial Number: 240327R3

Engineer

Byeonghun Cho from DAEIL SYSTEMS

Tuning Date

June 25, 2024

Report written date

July 6, 2024

End User

N/A

Number of Tuning Trial

1st tuning

Location

N / A

Equipment

Manufacturer: ZEISS

Equipment: FE-SEM

Model: GeminiSEM 360

Equipment Condition

The equipment is installed

Data and Image

Vertical Transmissibility

Image 1 — DVIA-MB1000 (240327R3) ZEISS GeminiSEM 360 Installation Report

Left to Right Transmissibility

Image 2 — DVIA-MB1000 (240327R3) ZEISS GeminiSEM 360 Installation Report

Front to Back Transmissibility

Image 3 — DVIA-MB1000 (240327R3) ZEISS GeminiSEM 360 Installation Report

Equipment picture

Image 4 — DVIA-MB1000 (240327R3) ZEISS GeminiSEM 360 Installation Report

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude µm/s (µin/s)	Detail Size µm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

1. As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

2. Detail size refers to width in microelectronics fabrication or particle size in medical research.

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