ETRI Daejeon DVIA-P2200 Installation Report

DVIA-P Series

Installation Report

ETRI

DVIA-P2200

Prepared by

Engineer: Hosang Yu

Tuning date: 23.07.28

Report written date: 23.08.03

Date of business trip: 17.12.27~17.12.29

The DVIA-P2200 active vibration isolation platform is appropriately installed and functioning as intended.

Model: DVIA-P2200

Serial Number: 230518R9

Hosang Yu from DAEIL SYSTEMS

July 28, 2023

한국전자통신연구원 C/R 1F, Daejeon

장비 설치 전 1차 TEST

Measurement Point	Z-axis (Vertical) 1-10 Hz	Z-axis (Vertical) 10-80 Hz	X-axis (Left to Right) 1-10 Hz	X-axis (Left to Right) 10-80 Hz	Y-axis (Front to Back) 1-10 Hz	Y-axis (Front to Back) 10-80 Hz
Floor	E	E	E	D	E	D
Active	G	F	G	F	G	F

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A