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Installation Report
DVIA-ULF Series
05-13-2019

Sungkyunkwan University NIKON C11330 (ORCA-Flash4.0) DVIA-UD350 (P5) Performance Report

DVIA-UD Series
Installation Report
Sungkyunkwan University
Nikon
ORCA-Flash4.0
DVIA-UD350
P5
201905

Contents

Sungkyunkwan University (UD350_P5 Set_Up)

Site checklist

Target equipmentNIKON_C11330 (ORCA-Flash4.0)
Place of installationSungkyunkwan University N Center, 2nd floor
RemarkVibration isolation performance is good
END USERSungkyunkwan University

Trip and report dates

Trip date: 2019-05-09

Operator: Hyoungmun Choi

Report date: 2019-05-13

Overview

After installation of the vibration isolation platform, the vibration environment was measured to confirm there is no problem for equipment use. Measurement date: Tuesday, 2019-05-13; operator: Hyoungmun Choi, DAEIL SYSTEMS; place of measurement: Sungkyunkwan University N Center 2nd floor analysis lab; equipment model: NIKON_C11330 (ORCA-Flash4.0).

Measurement summary (VC-Class, general condition)

Test ConditionVC-Class (general condition)
Z
FloorC
Isolation tabletopF

Omnidirectional performance is favorable; VC-Class graphs are attached. Measurements were taken under general conditions (SEM pump running) and routine conditions (SEM/coating equipment pumps running / people walking). Even when the surroundings change (pumps operating or people moving), the vibration environment at the isolation tabletop is not greatly affected.

U350 internal program performance measurement result

Z axis (internal program)

X axis (internal program)

Y axis (internal program)

Octave Band Result (BASE: 바닥, TOP: 제진대 상부)

Z axis (octave band)

X axis (octave band)

Y axis (octave band)

Reference

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

*Notes:*

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-ULF Series
Date05-13-2019
Tags
DVIA-UD Series
Installation Report
Sungkyunkwan University
Nikon
ORCA-Flash4.0
DVIA-UD350
P5
201905

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