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Installation Report
DVIA-M Series
03-30-2016

Tier-1 Semiconductor DVIA-MB3000 P5 vibration survey — Hwaseong NRD Building (2016.03.30)

DVIA-M Series
Installation Report
Tier-1 Semiconductor
DVIA-MB3000
MB3000 P5
VC class

Overview

After installing the vibration isolation platform, the vibration environment was measured to verify there would be no issues for equipment operation.

Measurement date

30 March 2016 (Wednesday)

Operator

Lim Jong-wook, DAEIL SYSTEMS

Measurement site

Tier-1 Semiconductor Hwaseong campus, NRD building, 6th floor

Measurement conditions and results

Measurement conditions: Vibration levels were measured on the DVIA-MB3000 upper platform and on the research-building floor and expressed as VC classes.

Measurement result summary

Test conditionZXY
FloorABA
Platform topDEF

For the vertical axis, the condition is favorable at D class at 50 Hz and at E class across the remaining frequency bands.

For the horizontal axes, the condition is favorable at E class on X and at F class on Y.

Equipment allowable vibration criteria are approximately close to D class as shown in the diagrams below; vibration levels on the isolator upper surface are favorable at or below D class in all directions, satisfying the equipment criteria.

Equipment allowable vibration criteria

Vertical vibration criterion diagram

Horizontal vibration criterion diagram

VC-CLASS vibration environment graphs

Vertical axis (Z) vibration level

Horizontal axis (X) vibration level

Horizontal axis (Y) vibration level

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date03-30-2016
Tags
DVIA-M Series
Installation Report
Tier-1 Semiconductor
DVIA-MB3000
MB3000 P5
VC class