Tier-1 Semiconductor MB3000 P2 Cheongju vibration environment measurement — 2015.10.16
Contents
Overview
After installation of the isolation platform, the vibration environment was measured to verify that equipment operation would not be adversely affected.
Measurement date: Friday, 16 October 2015
Engineer: Jong-wook Lim, DAEIL SYSTEMS
Measurement site: Tier-1 Semiconductor Cheongju Fab 1, P&T2 analysis laboratory, 4th floor, NAND Quality Team
Measurement conditions and results
The MB3000 top plate and the laboratory floor were each measured. Results are expressed as VC-CLASS.
Measurement results summary
| Test condition | Z | X | Y |
|---|---|---|---|
| Floor | C | D | D |
| Platform top | E | F | F |
Vertically (Z), performance from 0–20 Hz is good; above 20 Hz, performance is lower relative to the low-frequency band. Horizontally, a large low-frequency peak near 3 Hz on the floor is not present at the platform top.
At low frequencies, crossings between TOP and BASE traces may reflect influences other than structural vibration (for example electrical noise and HVAC effects).
With the isolator applied, the platform top is E Class vertically and F Class horizontally, which is favorable.
Before using the isolator, images shook at high magnification; after isolator use, image shake was no longer observed.