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Installation Report
DVIA-ULF Series
12-05-2019

Institute for Basic Science 2F Analysis Lab DVIA-UD350 P16 Installation Report

DVIA-UD Series
Installation Report
Institute for Basic Science
DVIA-UD350
P16
2019

Contents

Institute for Basic Science (UD350_P16 Set_Up)

Site checklist

Target equipmentUnknown
Place of installationInstitute for Basic Science 2F analysis laboratory
RemarkIsolator performance — good
END USERInstitute for Basic Science

Trip and report dates

Date of business trip: December 4, 2019

Engineer: Doo-hyun Kim

Report written date: December 5, 2019

Overview

After isolator installation, the vibration environment was measured to confirm there would be no issues for equipment use. Measurement date: December 6, 2019 (Monday). Measured by DAEIL SYSTEMS Manager Kim Doo-hyun. Measurement site: Institute for Basic Science 2F analysis laboratory. Equipment model: UNKNOWN. Omnidirectional performance is satisfactory; VC-Class graphs are attached.

Measurement summary (VC-Class)

Test ConditionVC-Class (general conditions)
Z
Building floorB
Isolator top plateE

U350 internal program performance measurement result

Z axis (internal program)

X axis (internal program)

Y axis (internal program)

Octave Band Result (BASE: Floor, TOP: Above isolation platform)

Z axis (octave band)

X axis (octave band)

Y axis (octave band)

Reference

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

*Notes:*

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-ULF Series
Date12-05-2019
Tags
DVIA-UD Series
Installation Report
Institute for Basic Science
DVIA-UD350
P16
2019

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