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Installation Report
09-29-2026

LG Innotek NanoSystem White-Light Interferometer DVIA-ULF1000 Installation Report

DVIA-ULF Series
Installation Report
LG Innotek
LG이노텍
NanoSystem
White-Light Interferometer
DVIA-ULF1000
260821S1

Overview

Following the installation of DVIA-ULF1000 in the 2F cleanroom of Gumi Plant 4 (LG Innotek), tuning and performance verification were performed.

Inspection and vibration measurement were conducted in the IDLE state.

Data is represented in VC Curve format and reference material on the vibration level is provided.

Vibration Isolation System Information

Model: DVIA-ULF1000

Serial Number: 260821S1

Engineer

Gyumin Park · DAEIL SYSTEMS

Tuning Date

26.09.29

Site

2F cleanroom, Gumi Plant 4

End User

LG Innotek

Customer Equipment

Manufacturer: NanoSystem

Equipment: Precision measurement equipment (white-light interferometer)

Model: -

Vibration Specification

-

Equipment Condition

IDLE

Vibration Measurement Equipment

Hardware: DVIA-ULF1000

Software: Monitor_TU_6DOF

Conclusion

1) Installation and Vibration Isolation Performance (IDLE State)

Installation Summary: The installation and tuning of DVIA-ULF1000 for the NanoSystem precision measurement equipment (white-light interferometer) in the 2F cleanroom of Gumi Plant 4 (LG Innotek) was completed.

IDLE (static) performance: The measurement results confirmed vibration levels of VC-F on the Vertical (Z-axis), VC-E on the Left to Right (X-axis), and VC-D on the Front to Back (Y-axis), verifying excellent vibration isolation performance.

2) On-site Measures and Dynamic Performance Test Progress

Day 1 (9/28):

After the initial installation and tuning, attempts were made to verify performance in the static state and stability against eccentricity changes during stage operation.

Because the shortest length of the level feet under the top equipment was similar to the ULF unit height, an interference (collision) issue occurred between the level feet and the floor during stage operation, and the work was carried over to next-day rework for height correction.

Day 2 (9/29):

After placing a rubber isolation pad under the vibration isolation unit to secure height, the reinstallation and retuning were completed.

Actual measurement performance verification: After loading a dummy wafer and running the recipe (X/Y-axis stage movement), a performance test under the stage-stopped condition showed that vibration was significantly improved compared to before, confirming that normal equipment operation is possible.

3) Follow-up Plan and Recommendations

Unit position fixation: To prevent unit position displacement during continuous stage operation and to prevent the installed equipment from falling, anchoring to the floor with anchor bolts is recommended.

Measurement Data Summary

Measurement PointVibration SpecificationMeasured AxisMeasured Result
FloorDVIA-ULF1000
1. Floor
2. DVIA-ULF1000
See Section 8Vertical (Z-axis)Operating Theatre (ISO)VC-F
Left to Right (X-axis)Operating Theatre (ISO)VC-E
Front to Back (Y-axis)Operating Theatre (ISO)VC-D

Measurement Data

Vertical (Z-axis)

Z-axis — Autospectrum

Z-axis — VC Curves

Left to Right (X-axis)

X-axis — Autospectrum

X-axis — VC Curves

Front to Back (Y-axis)

Y-axis — Autospectrum

Y-axis — VC Curves

Installation Photos

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion CurveDescriptionAmplitude
(μm/s) (μin/s)
Detail Size
(μm)
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.100 (4,000)25
VC-AAdequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment (including steppers) to 3μm line widths.25 (1,000)3
VC-CAppropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.12.5 (500)1-3
VC-DSuitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.6.25 (250)0.1-0.3
VC-EA challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.3.12 (125)< 0.1
VC-FAppropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.1.56 (62.5)N/A
VC-GAppropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.0.78 (31.3)N/A

Notes:

1. As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

2. The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc. It is to imaging associated with probe technologies, AFMs, and nanotechnology.

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Case Study Information

Category
Installation Report
Date09-29-2026
Tags
DVIA-ULF Series
Installation Report
LG Innotek
LG이노텍
NanoSystem
White-Light Interferometer
DVIA-ULF1000
260821S1