Installation Report

DVIA-M Series

06-26-2026

TF AMD Microelectronics Penang TESCAN AMBER X GMH FIB-SEM DVIA-ML1000 Installation Report

DVIA-M Series

Installation Report

TF AMD Microelectronics

TESCAN

AMBER X GMH

FIB-SEM

DVIA-ML1000

260226R2

Penang

Overview

The DVIA-ML1000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-ML1000

Serial Number: 260226R2

Engineer

Juhyeok Kim, DAEIL SYSTEMS

Installation Date

June 3, 2026

End User

TF AMD Microelectronics (Penang)

Number of Tuning Trial

1st

Location

Penang, Malaysia

Equipment

Manufacturer: TESCAN

Equipment: FIB-SEM

Model: AMBER X GMH

Tuning Request

N/A

Vibration Specification

Built-in Isolator in the plinth

Specification (Vertical & Horizontal)

- For pneumatic suspension: < 5 µm/s below 30 Hz, < 10 µm/s above 30 Hz

- For active isolation: < 10 µm/s below 30 Hz, < 20 µm/s above 30 Hz

Measurement Summary

Measurement Point	Vibration Specification	Axis	Floor	DVIA-ML1000
1. Floor 2. DVIA-ML1000	Refer to Vibration Specification	Vertical	✗ FAIL	✓ PASS
		Left to Right	✓ PASS	✓ PASS
		Front to Back	✓ PASS	✓ PASS

Data and Image

Vertical Autospectrum

Vertical VC Curves

Vertical Transmissibility

Left to Right Autospectrum

Left to Right VC Curves

Left to Right Transmissibility

Front to Back Autospectrum

Front to Back VC Curves

Front to Back Transmissibility

Installation Photo

Reference

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A