Installation Report

07-22-2026

Tier-1 Semiconductor Hwaseong Advantest DR-SEM E5610 DVIA-P4000 Installation Report

DVIA-P Series

Installation Report

Tier-1 Semiconductor

Advantest

DR-SEM

E5610

DVIA-P4000

260204R5

Report Information

Report: DVIA-P4000 Installation Report, S/N 260204R5

Author: Donggyu Park · DAEIL SYSTEMS

Installation date: 2026.07.22

Report date: 2026.07.27

Overview

After installing the DVIA-P4000 on the 3rd floor of the V1 line at a Tier-1 Semiconductor site in Hwaseong, tuning and vibration measurement were carried out.

Inspection and vibration measurement were performed with the equipment installed and turned on.

The data is presented as Autospectrum (µm p-p), and Reference materials on the vibration levels are provided.

Vibration Isolation Table

Model: DVIA-P4000

Serial Number: 260204R5

Engineer

Donggyu Park

Gyumin Park

Tuning Date

2026.07.22

Installation Site

3rd floor, V1 line, Hwaseong

End User

Customer: Tier-1 Semiconductor

Customer Equipment

Manufacturer: ADVANTEST

Equipment: DR-SEM

Model: E5610

Vibration Specification

Frequency [Hz]	Limit [µm p-p]
0.5~10	1.0 or less
10~25	0.1 or less
25~100	0.03 or less

Equipment Status

Equipment installed and turned on

Vibration Measurement Equipment

Measurement Equipment

- Hardware: B&K Front End Type 3040-A-040

- Software: B&K Pulse Labshop22 Version

Accelerometer

- PCB 393B05

Vibration Measurement Setup

F Span: 200 Hz

Lines: 2400

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

Conclusion

As a result of the inspection, the top plate of the vibration isolation table (DVIA-P4000) met the required specification in all three axes: X, Y and Z. For the floor, the required specification was exceeded in the vertical (Z-axis) and front-back (Y-axis) directions, and it was measured as Fail. It was also confirmed that the air piping is connected without any problems and air is supplied to the vibration isolation table without any problems.

Measurement Data Summary

Measurement Position	Vibration Specification	Measured Axis	Measurement Result
Measurement Position	Vibration Specification	Measured Axis	Floor	DVIA-P4000
1. Floor 2. DVIA-P4000	Refer to the Vibration Specification section	Vertical (Z-axis)	✗ Fail	✓ PASS
		Left-Right (X-axis)	✓ PASS	✓ PASS
		Front-Back (Y-axis)	✗ Fail	✓ PASS

Measurement Data

Vertical (Z-axis) Autospectrum

Image 1 — Tier-1 Semiconductor Hwaseong Advantest DR-SEM E5610 DVIA-P4000 Installation Report

Left-Right (X-axis) Autospectrum

Image 2 — Tier-1 Semiconductor Hwaseong Advantest DR-SEM E5610 DVIA-P4000 Installation Report

Front-Back (Y-axis) Autospectrum

Image 3 — Tier-1 Semiconductor Hwaseong Advantest DR-SEM E5610 DVIA-P4000 Installation Report

Reference

The table below is the vibration level classification of IEST-RP-CC012.2.

Criterion Curve	Description	Amplitude ¹ µm/s (µin/s)	Detail Size ² µm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances. Generally suitable for computer equipment, hospital recovery rooms, semiconductor probe test equipment and microscopes below 40x.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for operating rooms, 100x microscopes and other low-sensitivity equipment in most instances.	100 (4,000)	25
VC-A	Generally suitable for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.	50 (2,000)	8
VC-B	Suitable for inspection and lithography equipment (including steppers) up to 3μm line width.	25 (1,000)	3
VC-C	Standard suitable for optical microscopes to 1000x and lithography and inspection equipment (including medium-sensitivity electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.	12.5 (500)	1-3
VC-D	Generally suitable for demanding equipment, including many electron microscopes (SEM and TEM) and E-Beam systems.	6.25 (250)	0.1-0.3
VC-E	Difficult-to-achieve criterion. Assumed to be suitable for the most demanding, highly sensitive systems, including long-distance, laser-based, small-target systems operating at nanometer scale, E-Beam lithography systems, and other systems requiring special dynamic stability.	3.12 (125)	<0.1
VC-F	Suitable for extremely quiet research spaces. Difficult to achieve in most instances, especially in clean rooms. Not used as a design criterion; recommended for evaluation only.	1.56 (62.5)	N/A
VC-G	Suitable for extremely quiet research spaces. Difficult to achieve in most instances, especially in clean rooms. Not used as a design criterion; recommended for evaluation only.	0.78 (31.3)	N/A

¹ Measured in 1/3 octave bands over 8~80 Hz (VC-A and VC-B) or 1~80 Hz (VC-C~VC-G).

² Detail size indicates line width in microelectronics manufacturing, particle (cell) size in medical and pharmaceutical research, etc. This corresponds to imaging related to probe technology, AFM and nanotechnology.

The information provided in this table is for reference. In most cases, it is recommended to seek advice from an expert who is well familiar with the application of the equipment and process and its vibration requirements.

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