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Installation Report
DVIA-P Series
10-28-2025

Tier-1 Semiconductor Fabrication Facility Hwaseong NRD Line Bruker FP-III DVIA-P4000 Installation Report

DVIA-P Series
Installation Report
Tier-1 Semiconductor Fabrication Facility
Bruker
FP-III

Overview

Inspection and vibration measurement were performed on the DVIA-P4000 installed at Tier-1 Semiconductor Fabrication Facility Hwaseong NRD Line 3F 51bay.

Upon initial inspection, the isolator was confirmed to be operating normally.

There were no functional issues with the isolator; re-tuning was performed at the customer's request.

Inspection and vibration measurement were conducted with the equipment installed and in IDLE state. IDLE-state equipment vibration may affect tuning and vibration measurement.

Data are presented as VC curves, along with reference materials for vibration level assessment.

Vibration Isolation System Information

Model: DVIA-P4000

Serial Number: 039887B

Engineer

Chaewon Lee from DAEIL SYSTEMS

Inspection Date

October 28, 2025

Installation Site

Tier-1 Semiconductor Fabrication Facility Hwaseong NRD Line 3F 51bay

End User

Tier-1 Semiconductor

Equipment

Manufacturer: Bruker

Equipment: 3rd Generation Femto-Pulse Laser Repair System

Model: FP-III

Equipment Specification

VC-E

Equipment Status

Equipment installed and IDLE

Measuring Equipment

Data Physics DAQ

Hardware: QUATTRO, Serial Number: 22436

Software: SignalCalc ACE

Accelerometer

PCB Accelerometer

Model: 393B05

Measuring Set-up

F Span: 200 Hz

Lines: 3200

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

Averaging mode: Exponential, 40

Conclusion

Compared with before isolator tuning, overall performance improved.

In the measurement results, some bands in all directions showed SPEC Out, which is presumed to be vibration occurring while the equipment was in IDLE state.

Measurement Data

Measuring PointStateDirectionVibration specMeasurement DataResult
------------Before TuningAfter Tuning
Tier-1 Semiconductor Fabrication Facility Hwaseong
NRD Line 3F 51bay
1. Before tuning
2. After tuning
Equipment installed / IDLEVerticalVC-EVC-B
@ 80 Hz
VC-C
@ 80 Hz
Left to RightVC-C
@ 31.5 Hz
VC-C
@ 31.5 Hz
Front to BackVC-D
@ 16 Hz
VC-E
@ 16 Hz

Data and Image

Vertical VC Curves

Vertical Autospectrum

Left to Right VC Curves

Left to Right Autospectrum

Front to Back VC Curves

Front to Back Autospectrum

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-P Series
Date10-28-2025
Tags
DVIA-P Series
Installation Report
Tier-1 Semiconductor Fabrication Facility
Bruker
FP-III