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Installation Report
DVIA-P Series
09-26-2024

Tier-1 Semiconductor Fabrication Facility Pyeongtaek P4 Bruker nm-VI DVIA-P4000 Installation Report

DVIA-P Series
Installation Report
Tier-1 Semiconductor Fabrication Facility
Bruker
nm-VI

Overview

Tuning and vibration measurement were performed on the DVIA-P4000 installed at Tier-1 Semiconductor Fabrication Facility Pyeongtaek P4 3rd floor line.

Air piping connection work was conducted before tuning.

Tuning and vibration measurement were conducted before equipment placement.

Performance check was conducted by connecting DVIA-P4000 to a laptop and performing feedback and feedforward tuning via UI software, followed by vibration measurement using Data Physics measurement equipment.

Data are presented as VC Curves, along with reference materials for vibration level assessment.

Vibration Isolation System Information

Model: DVIA-P4000

Serial Number: 230926R1

Engineer

Chaewon Lee from DAEIL SYSTEMS

Tuning Date

September 26, 2024

Installation Site

Tier-1 Semiconductor Fabrication Facility Pyeongtaek P4 3rd floor line

Equipment

Manufacturer: Bruker

Equipment: nm-VI

Model: Photomask repair

Vibration Specifications

VC-D

Equipment Status

Equipment is uninstalled

Tuning Count

1st Time

Measuring Equipment

Brüel & Kjær LAN-XI DAQ Type 3050

Hardware: B&K Front End Type 3050-A-040

Software: B&K Pulse Labshop 22 Version

Accelerometer

PCB Accelerometer

Model: 393B05

Measuring Set-up

Bandwidth: 200 Hz

Lines: 800

Averaging: Spectrum Averaging

Engineering Units: m/s^2

Window: Hanning

Overlap: Max

Conclusion

Meets vibration specifications in all directions.

Measurement Data

Measuring PointStatusDirectionSpecMeasurement DataResult
Base PadDVIA-P4000Base PadDVIA-P4000
FAB
1. Base Pad
2. DVIA-P4000
Equipment is
uninstalled.
Vertical6.25E-06 m/s
(VC-D)
2.59E-06 m/s
@ 31.5 Hz
2.28E-07 m/s
@ 31.5 Hz
PASSPASS
Left to Right6.25E-06 m/s
(VC-D)
8.45E-06 m/s
@ 80 Hz
1.85E-07 m/s
@ 80 Hz
FAILPASS
Front to Back6.25E-06 m/s
(VC-D)
5.33E-06 m/s
@ 50 Hz
1.94E-07 m/s
@ 5 Hz
PASSPASS

Data and Image

Vertical VC Curves

Left to Right VC Curves

Front to Back VC Curves

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-P Series
Date09-26-2024
Tags
DVIA-P Series
Installation Report
Tier-1 Semiconductor Fabrication Facility
Bruker
nm-VI