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Installation Report
DVIA-P Series
04-03-2026

Tier-1 Semiconductor Fabrication Facility Pyeongtaek P4 3F Line B05 Bruker NM-VI DVIA-P4000 Installation Report

DVIA-P Series
Installation Report
Tier-1 Semiconductor Fabrication Facility
Bruker
nm-VI

Overview

An issue occurred on the DVIA-P4000 controller installed at Tier-1 Semiconductor Fabrication Facility Pyeongtaek site P4 3rd floor Line B05; after replacing the controller, tuning and vibration measurement were performed.

This issue is assessed as a recurrence of the problem that occurred on August 18, 2025, and monitoring is required to determine whether the same issue occurs again.

Ongoing monitoring is required to confirm recurrence, and a follow-up visit is planned after one month to inspect the controller.

Tuning and vibration measurements were conducted with the equipment Turned on/IDLE.

Data are presented as VC curves with reference materials describing vibration levels.

Vibration Isolation System Information

Model: DVIA-P4000

Serial Number: 230207R1

Engineer

Chaewon Lee from DAEIL SYSTEMS

Tuning Date

April 1, 2026

Installation Site

Tier-1 Semiconductor Fabrication Facility Pyeongtaek P4 3F Line B05

End User

Tier-1 Semiconductor

Equipment

Manufacturer: Bruker

Equipment: NM-VI

Model: Photomask repair

Equipment Specification

VC-D

Equipment Status

Equipment is installed and Turned on/IDLE

Measuring Equipment

10.1) Data Physics DAQ

Hardware: QUATTRO, Serial Number: 22436

Software: SignalCalc ACE

10.2) Accelerometer

PCB Accelerometer

Model: 393B05

Measuring Set-up

F Span: 200 Hz

Lines: 3200

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

Averaging mode: Exponential, 40

Conclusion

Normal operation of the vibration isolation system was verified after controller replacement.

Vibration specifications are met in all directions.

A follow-up visit after about one month is required to check for recurrence and to verify operation of the high-end controller.

Measurement Data

Measuring PointStatusDirectionSpecMeasurement DataResult
FloorDVIA-P4000FloorDVIA-P4000
Tier-1 Semiconductor Fabrication Facility P4 Line 3F B05
1. Floor vibration
2. DVIA-P4000
Turned on/ IDLEVC-DVerticalVC-D @ 50 HzVC-F @ 50 HzPASSPASS
Tier-1 Semiconductor Fabrication Facility P4 Line 3F B05
1. Floor vibration
2. DVIA-P4000
Turned on/ IDLEVC-DLeft to RightVC-C @ 20 HzVC-F @ 20 HzFAILPASS
Tier-1 Semiconductor Fabrication Facility P4 Line 3F B05
1. Floor vibration
2. DVIA-P4000
Turned on/ IDLEVC-DFront to BackVC-D @ 80 HzVC-G @ 80 HzPASSPASS

Data and Image

Vertical VC Curves

Left to Right VC Curves

Front to Back VC Curves

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-P Series
Date04-03-2026
Tags
DVIA-P Series
Installation Report
Tier-1 Semiconductor Fabrication Facility
Bruker
nm-VI