Sungkyunkwan University JEOL JBX-8100FX DVIA-P2200 (220509R3) Inspection Report

DVIA-P Series

Installation Report

Sungkyunkwan University

JEOL

JBX-8100FX

DVIA-P2200

Overview

Prepared for: Sungkyunkwan University

While the DVIA-P2200 was in use, the Caution VIB LED illuminated and an inspection was requested.

Feedback and feedforward re-tuning were completed (performance is good).

After tuning, insufficient air supply capacity lowered the pressure shown on the regulator and digital gauge, so the Caution AIR LED illuminated (no impact on performance).

System Information

Model: DVIA-P2200

Serial Number: 220509R3

Engineer

Youngha Lee, Jongwon Park from DAEIL SYSTEMS

Tuning date: 23.10.31

Report written date: 23.10.31

Date of business trip : 17.12.27~17.12.29

Inspection Date

October 31, 2023

Location

Sungkyunkwan University Research Building

Equipment

JEOL JBX-8100FX (E-Beam Lithography)

Summary of Vibration Results

Measurement Point	Z-axis (Vertical) 1-10 Hz	Z-axis (Vertical) 12.5-80 Hz	X-axis (Left to Right) 1-10 Hz	X-axis (Left to Right) 12.5-80 Hz	Y-axis (Front to Back) 1-10 Hz	Y-axis (Front to Back) 10-80 Hz
Floor	D	A+	A+	E	D	E
Active	G	D	D	F	E	F

Data and Image

Z-axis (Vertical) VC curves

X-axis (Left to Right) VC curves

Y-axis (Front to Back) VC curves

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A