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Installation Report
DVIA-T Series
05-04-2026

WONIK IPS DVIA-T78 (211213R1) Installation Report

DVIA-T Series
Installation Report
WONIK IPS
DVIA-T78
211213R1

Engineer

Engineer: Chaewon Lee

Installation Date

April 29, 2026

Report Written Date

May 4, 2026

Overview

Inspection was performed on the DVIA-T78 installed in the 4F wafer analysis lab at the WONIK IPS Jinwi site.

Inspection and vibration measurements were conducted with the equipment in a Turned on/IDLE state.

Data are presented as VC curves, and Reference materials are provided for the vibration levels.

Vibration Isolation Platform

Model: DVIA-T78

Serial number: 211213R1

Field Engineer

Chaewon Lee from DAEIL SYSTEMS, field engineer

Tuning Date

April 29, 2026

Installation Site

WONIK IPS Jinwi site, 4F wafer analysis lab

End User

WONIK IPS

Customer Equipment

Manufacturer: Bruker

Equipment: Nano Indentation tester

Model: TS77

Equipment Specification

N/A

Equipment Status

Equipment installed / Turned on/IDLE

Measuring Equipment

1) Data Physics DAQ

Hardware: QUATTRO, Serial Number: 22436

Software: SignalCalc ACE

2) Accelerometer

PCB Accelerometer

Model: 393B05

Vibration Measurement Setup

F Span: 200 Hz

Lines: 3200

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

Averaging mode: Exponential, 40

Conclusion

On-site inspection results showed that the DVIA-T78 isolator delivered very good overall performance. In all directions it demonstrated more than 90% isolation performance above 2 Hz, confirming that the isolator itself was operating normally.

Together with the Bruker engineer, we examined changes in floor vibration and isolator-top vibration at the moments when image noise appeared on the TS77 tool. The measurements showed that, at the times when image noise occurred, both floor vibration and DVIA-T78 top vibration increased in the 1–10 Hz band compared with steady-state conditions.

Even at those moments, the DVIA-T78 attenuated VC-B/C-class floor vibration toward VC-D/E on the top surface, which means the isolator was still performing its isolation function normally.

Therefore, the main cause of TS77 image noise is judged not to be isolator performance degradation, but an increase in building vibration that raised the isolator-top level together with the floor. In other words, although the isolator substantially attenuated floor vibration, when building vibration itself rises the top vibration can still increase relatively and affect image quality.

For stable operation and reduced image noise, we recommend relocating the equipment to a location with lower and more stable floor vibration than the current installation site.

Measurement Data

Place of MeasurementStatusDirectionFloorDVIA-T78
WONIK IPS Jinwi site, 4F wafer analysis lab
1. Floor vibration
2. DVIA-T78
Turned on/IDLEVerticalVC-A @ 63 HzVC-G @ 63 Hz
Left to RightVC-A @ 10 HzVC-F @ 10 Hz
Front to BackVC-A @ 10 HzVC-G @ 10 Hz

Data and Image

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC Curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

14-2) DVIA-T78 steady-state vs. noise-event vibration comparison Data

Steady-state vibration Data

Vibration data during noise events

Reference

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-T Series
Date05-04-2026
Tags
DVIA-T Series
Installation Report
WONIK IPS
DVIA-T78
211213R1