Installation Report

DVIA-M Series

01-10-2022

YIMO UB1000 P24 (200828R4) ZEISS Sigma 300 remote tuning measurement report

DVIA-M Series

Installation Report

YIMO

Tier-1 Semiconductor

UB1000

200828R4

P24

ZEISS

Sigma 300

UB1000_P24 200828R4 Set up

Target equipment

ZEISS - Sigma 300

Place of installation

N/A

Remark

Good Performance

END USER

N/A

Operator: CHOI, HYOUNGMUN

Date of setup : 22.01.10

Date of reporting : 22.01.10

Date of business trip : 17.12.27~17.12.29

Overview

After Active mounting, measure the vibration environment to check that there is no problem in using the equipment.

Measurement date: 22.01.10(Mon)

Operator: Daeil System, Research engineer CHOI, HYOUNGMUN

Place of measurement :

N/A

Equipment Model: ZEISS-Sigma 300

Measurement conditions and results

Summary of measurement results

Axis	Transmissibility at 5 Hz	Transmissibility at 10 Hz
Z	-17 dB	-25 dB
X	-16 dB	-25 dB
Y	-17 dB	-25 dB

Good omnidirectional performance.

UB1000 internal program performance measurement result

Z axis

X axis

Y axis

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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