Installation Report

DVIA-M Series

06-27-2019

Nissan Chemical Helios G4 UC DVIA-MB1000 Installation Report (SN 190531R3, 2019-06-27)

DVIA-M Series

Installation Report

Nissan Chemical

Helios G4 UC

DVIA-MB1000

DVIA-ML1000

SEM

Equipment picture

Target equipment

Helios G4 UC

Place of installation

Nissan chemical F1

Remark

Good Performance

END USER

Nissan chemical

Operator:

Choi, Sung Won

Date of setup

: 19.06.24

Date of reporting

: 19.06.27

Date of business trip

: 17.12.27~17.12.29

Overview

After Active mounting, measure the vibration environment to check that there is no problem in using the equipment.

Measurement date: 2019.06.24 (Tuesday),

Operator: Daeil System, Manager Sung Won Choi

Place of measurement : 1st Floor, Nissan chemical

Equipment Model: Helios G4 UC

Measurement conditions and results

Summary of measurement results

Test Condition	VC-Class
	Z	X	Y
Floor	D	D	C
Above Active	F	E	E

Good omnidirectional performance.

MB1000 internal program performance measurement result

Z axis

X axis

Y axis

Octave Band Result (BASE: Floor, TOP: Above Active)

Z axis

X axis

Y axis

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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