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Installation Report
DVIA-M Series
04-23-2026

Zhejiang Eagle Semiconductor ZEISS Crossbeam 550 DVIA-ML1000 (260110R3) Installation Report

DVIA-M Series
Installation Report
DVIA-ML1000
260110R3
Zhejiang Eagle Semiconductor
ZEISS
Crossbeam 550
FIB-SEM
China

Prepared by

Engineer: Chaewon Lee

Tuning date: 26.04.20

Report written date: 26.04.23

Overview

The DVIA-ML1000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-ML1000

Serial Number: 260110R3

Engineer

Chaewon Lee DAEIL SYSTEMS

Tuning Date

April 20, 2026

End User

Zhejiang Eagle Semiconductor Vibration Isolation Table

Number of Tuning Trial

1st

Location

Zhejiang, China

Equipment

Manufacturer: ZEISS

Equipment: FIB-SEM

Model: Crossbeam 550

Vibration specification

Equipment Condition

The equipment is turned on/IDLE

Tuning Request

N/A

Measurement Summary

Measurement locationStatusDirectionVibration specificationFloor vibrationDVIA-ML1000Floor resultPlatform result
1.Floor 2.DVIA-ML1000Equipment is Turned on/IDLEVerticalRefer to item 94.62 @ 15.5 Hz0.11 @ 15.5 HzPASSPASS
Left to RightRefer to item 90.71 @ 4.5 Hz0.14 @ 4.5 HzPASSPASS
Front to BackRefer to item 90.58 @ 3.5 Hz0.034 @ 3.5 HzPASSPASS

Measurement Data Obtained via UI Program

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date04-23-2026
Tags
DVIA-M Series
Installation Report
DVIA-ML1000
260110R3
Zhejiang Eagle Semiconductor
ZEISS
Crossbeam 550
FIB-SEM
China